Patents by Inventor Logan L. Simpson
Logan L. Simpson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11927883Abstract: A performance monitor determines a performance characteristic of a plurality of dispensers receiving fluid from a reservoir. Each of the plurality of dispensers has an actuator that, when actuated, causes the each of the dispensers to generate a droplet of the fluid. A driver generates a drive command to the actuator to adjust a physical attribute of the droplet based on the performance characteristic to satisfy a performance criteria.Type: GrantFiled: March 30, 2018Date of Patent: March 12, 2024Assignee: CANON KABUSHIKI KAISHAInventors: Steven Wayne Burns, Logan L. Simpson, Matthew C. Traub, Adam Shackleton, Whitney Longsine, Brent Andrew Snyder
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Patent number: 11762295Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.Type: GrantFiled: October 28, 2020Date of Patent: September 19, 2023Assignee: CANON KABUSHIKI KAISHAInventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher, Logan L. Simpson, James W. Irving
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Patent number: 11614693Abstract: A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.Type: GrantFiled: June 30, 2021Date of Patent: March 28, 2023Assignee: Canon Kabushiki KaishaInventors: Xiaoming Lu, Logan L. Simpson, Mario Johannes Meissl
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Publication number: 20230014261Abstract: A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.Type: ApplicationFiled: June 30, 2021Publication date: January 19, 2023Inventors: Xiaoming Lu, Logan L. Simpson, Mario Johannes Meissl
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Publication number: 20220128907Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.Type: ApplicationFiled: October 28, 2020Publication date: April 28, 2022Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher, Logan L. Simpson, James W. Irving
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Patent number: 11215921Abstract: A fabrication method comprises selecting an initial drop pattern defining a position of drops of a formable material, the initial drop pattern comprising a grid pattern of drops, designating the drops of the grid pattern to be dispensed by a first series of nozzles of a dispenser based on a spacing between drops in the Y-dimension; generating a modified drop pattern by shifting the grid pattern in a first direction along the Y-dimension, wherein a shift distance is selected such that the drops of the shifted grid pattern are designated to be dispensed from a second series of nozzles of the dispenser; dispensing the plurality of drops according to the modified drop pattern onto a substrate; during the dispensing of the drops, shifting a position of the stage or dispenser along the Y-dimension opposite to the first direction by an amount equal to the shift distance.Type: GrantFiled: October 31, 2019Date of Patent: January 4, 2022Assignee: Canon Kabushiki KaishaInventors: Ecron D. Thompson, Craig William Cone, Logan L. Simpson, Wei Zhang, James W. Irving
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Patent number: 11209730Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.Type: GrantFiled: March 14, 2019Date of Patent: December 28, 2021Assignee: CANON KABUSHIKI KAISHAInventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving
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Patent number: 11040366Abstract: A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.Type: GrantFiled: September 18, 2018Date of Patent: June 22, 2021Assignee: Canon Kabushiki KaishaInventors: Logan L. Simpson, Seth J. Bamesberger, John Williamson
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Publication number: 20210132491Abstract: A fabrication method comprises selecting an initial drop pattern defining a position of drops of a formable material, the initial drop pattern comprising a grid pattern of drops, designating the drops of the grid pattern to be dispensed by a first series of nozzles of a dispenser based on a spacing between drops in the Y-dimension; generating a modified drop pattern by shifting the grid pattern in a first direction along the Y-dimension, wherein a shift distance is selected such that the drops of the shifted grid pattern are designated to be dispensed from a second series of nozzles of the dispenser; dispensing the plurality of drops according to the modified drop pattern onto a substrate; during the dispensing of the drops, shifting a position of the stage or dispenser along the Y-dimension opposite to the first direction by an amount equal to the shift distance.Type: ApplicationFiled: October 31, 2019Publication date: May 6, 2021Inventors: Ecron D. Thompson, Craig William Cone, Logan L. Simpson, Wei Zhang, James W. Irving
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Publication number: 20200292934Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.Type: ApplicationFiled: March 14, 2019Publication date: September 17, 2020Inventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving
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Publication number: 20200086339Abstract: A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.Type: ApplicationFiled: September 18, 2018Publication date: March 19, 2020Inventors: Logan L. Simpson, Seth J. Bamesberger, John Williamson
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Publication number: 20190302610Abstract: A performance monitor determines a performance characteristic of a plurality of dispensers receiving fluid from a reservoir. Each of the plurality of dispensers has an actuator that, when actuated, causes the each of the dispensers to generate a droplet of the fluid. A driver generates a drive command to the actuator to adjust a physical attribute of the droplet based on the performance characteristic to satisfy a performance criteria.Type: ApplicationFiled: March 30, 2018Publication date: October 3, 2019Inventors: Steven Wayne Burns, Logan L. Simpson, Matthew C. Traub, Adam Shackleton, Whitney Longsine, Brent Andrew Snyder
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Patent number: 5498765Abstract: A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.Type: GrantFiled: September 26, 1994Date of Patent: March 12, 1996Assignee: International Business Machines CorporationInventors: Burton J. Carpenter, Jr., Michael G. McMaster, Joseph LaTorre, Logan L. Simpson
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Patent number: 5439766Abstract: According to the present invention, good image resolution of a cationically polymerized epoxy based coating, such as a solder mask or dielectric or etch resist, is provided by combining a cationically polymerized epoxy based coating with conventional epoxy glass substrates cured with a curing agent that does not produce basic reaction products. Preferably, the coating is photoimagable. The method for making the same is also provided. The coating material includes an epoxy resin system comprising between from about 10% to about 90%, preferably about 28% to about 57% by weight of a polyol epoxy resin, and from about 10% to about 90%, preferably about 43% to 72% by weight, of a brominated epoxy resin. Optionally, a polyepoxy resin or an epoxy creosol novolak resin is added to the resin system. The polyepoxy resin may be added from an effective amount up to less than 90% of the resin system; the epoxy creosol novolak may be added from an effective amount up to about 80 pph.Type: GrantFiled: November 13, 1992Date of Patent: August 8, 1995Assignee: International Business Machines CorporationInventors: Richard A. Day, Donald H. Glatzel, John R. Mertz, Joel L. Roth, David J. Russell, Logan L. Simpson
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Patent number: 5374500Abstract: A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.Type: GrantFiled: April 2, 1993Date of Patent: December 20, 1994Assignee: International Business Machines CorporationInventors: Burton J. Carpenter, Jr., Michael G. McMaster, Joseph LaTorre, Logan L. Simpson
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Patent number: 5272042Abstract: Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.Type: GrantFiled: September 17, 1991Date of Patent: December 21, 1993Assignee: International Business Machines CorporationInventors: Robert D. Allen, William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre, Michael G. McMaster, Melvin W. Montgomery, Wayne M. Moreau, Logan L. Simpson, Robert J. Tweig, Gregory M. Wallraff
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Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition
Patent number: 5266444Abstract: A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.Type: GrantFiled: September 10, 1992Date of Patent: November 30, 1993Assignee: International Business Machines CorporationInventors: Burton J. Carpenter, Jr., Joseph LaTorre, Michael G. McMaster, Logan L. Simpson -
Patent number: 5102772Abstract: Photocurable compositions with, as photoinitiator, sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R.sub.1 is a divalent organic bridge; each R.sub.2 and R.sub.3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R.sub.2 and R.sub.3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.Type: GrantFiled: July 10, 1991Date of Patent: April 7, 1992Assignee: IBMInventors: Raymond W. Angelo, Jeffrey D. Gelorme, Joseph P. Kuczynski, William H. Lawrence, Socrates P. Pappas, Logan L. Simpson
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Patent number: 5071730Abstract: A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.Type: GrantFiled: February 13, 1991Date of Patent: December 10, 1991Assignee: International Business Machines CorporationInventors: Robert D. Allen, William D. Hinsberg, III, Logan L. Simpson, Gregory M. Wallraff
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Patent number: 5055439Abstract: A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.Type: GrantFiled: December 27, 1989Date of Patent: October 8, 1991Assignee: International Business Machines CorporationInventors: Robert D. Allen, William D. Hinsberg, III., Logan L. Simpson, Robert J. Twieg, Gregory M. Wallraff, Carlton G. Willson