Abstract: A system and a method for monitoring change of intraocular pressure and a contact lens for sensing change of intraocular pressure are provided. The contact lens includes a first material layer and a first pattern. The center of the first material layer has an optical region, and the optical region corresponds to a cornea region of an eyeball. The first pattern is formed on the optical region. Furthermore, the contact lens may further include a second material layer and a second pattern. The second material layer is located on the first material layer. The second pattern is formed on the second material layer and overlaps with the first pattern to form a moire pattern.

Abstract: An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.

Abstract: A system and a method for monitoring change of intraocular pressure and a contact lens for sensing change of intraocular pressure are provided. The contact lens includes a first material layer and a first pattern. The center of the first material layer has an optical region, and the optical region corresponds to a cornea region of an eyeball. The first pattern is formed on the optical region. Furthermore, the contact lens may further include a second material layer and a second pattern. The second material layer is located on the first material layer. The second pattern is formed on the second material layer and overlaps with the first pattern to form a moire pattern.

Abstract: A feedback light tuning device and the optical communication system and method using the same are provided. By tuning the feedback light, the mechanism can completely correct the mean-wavelength drift up to 30 nm or 19400 ppm. The mechanism can be applied to various harsh environments which cause the mean-wavelength drift, so as to achieve a required stable mean-wavelength for the light source and to increase the acceptable range of radiation dose.

Abstract: An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.

Abstract: An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.

Abstract: A feedback light tuning device and the optical communication system and method using the same are provided. By tuning the feedback light, the mechanism can completely correct the mean-wavelength drift up to 30 nm or 19400 ppm. The mechanism can be applied to various harsh environments which cause the mean-wavelength drift, so as to achieve a required stable mean-wavelength for the light source and to increase the acceptable range of radiation dose.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: A nano/micro-patterned optical device includes a soft film substrate and nano/micro thin wires. A surface of the soft film substrate includes a nano/micro-pattern formed through a lithography process, and the nano/micro-pattern includes a plurality of depressed grooves. The nano/micro thin wires are placed in the depressed grooves, and used to form a plurality of optical waveguides, in which the optical waveguides include at least one optical coupling region, and the optical coupling region is located on a joining position of the optical waveguides. A fabrication method of the nano/micro-patterned optical device is also provided.

Abstract: An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.

Abstract: A nano/micro-patterned optical device includes a soft film substrate and nano/micro thin wires. A surface of the soft film substrate includes a nano/micro-pattern formed through a lithography process, and the nano/micro-pattern includes a plurality of depressed grooves. The nano/micro thin wires are placed in the depressed grooves, and used to form a plurality of optical waveguides, in which the optical waveguides include at least one optical coupling region, and the optical coupling region is located on a joining position of the optical waveguides. A fabrication method of the nano/micro-patterned optical device is also provided.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a composite light guiding curved surface structure, comprising a structure body and at least one light source. The structure body comprises a light-receiving surface being provided with a plurality of curved surfaces formed thereon, each of which being provided with a plurality of micro lenses. Each micro lens is further provided with a plurality of sub-wavelength anti-reflecting structures. The sub-wavelength anti-reflecting structures also cover the entire curved surface among lenses. At least one light source is disposed on one side of the light-receiving surface to generate a light field projecting to each of the curved surfaces on the light-receiving surface. In the present invention, the micro lens is capable of increasing the diffusing angle for light diffusion; meanwhile, the sub-wavelength anti-reflecting structures are capable of increasing the light transmission efficiency to reduce loss of light at the interface and enhance the utilization of light.

Abstract: A method for preparing a photonic crystal slab waveguides is disclosed, wherein the photonic crystal slab waveguides are prepared by combining near-field phase-shifting contact lithography (NFPSCL) with interference lithography (IL). Conventional methods used for preparing the photonic crystal slab waveguides, such as electron beam lithography or direct laser writing, are time consuming. In contrast, the present method allows rapid production of many photonic crystal slab waveguides over a large area composed of microstructures.

Abstract: A method of fabricating micro/nano optical wires is disclosed, which comprises: providing a micro/nano optical wire drawing device comprising a feeding wheel, a drawing wheel, and a heating unit; fastening one end of a micrometer-sized preform at the feeding wheel; making the other end of the preform pass through the heating unit and be fastened at the drawing wheel; and switching on the heating unit to heat the perform to a softening temperature of the preform and drawing the preform by the drawing wheel to form a micro/nano optical wire. A device of fabricating micro/nano optical wires is also disclosed.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: A method of malicious network activity detection. An intrusion detection system provides defense against distributed denial of service (DDOS) attacks through an efficient modeling process based on grey theory.

Abstract: A method of malicious network activity detection. An intrusion detection system provides defense against distributed denial of service (DDOS) attacks through an efficient modeling process based on grey theory.