Abstract: The present disclosure provides a method for fabricating an anti-reflective layer on a quartz surface by using a metal-induced self-masking etching technique, comprising: performing reactive ion etching to a metal material and a quartz substrate by using a mixed gas containing a fluorine-based gas, wherein metal atoms and/or ions of the metal material are sputtered to a surface of the quartz substrate, to form a non-volatile metal fluoride on the surface of the quartz substrate; forming a micromask by a product of etching generated by reactive ion etching gathering around the non-volatile metal fluoride; and etching the micromask and the quartz substrate simultaneously, to form an anti-reflective layer having a sub-wavelength structure.

Abstract: The present disclosure provides a defect detection method and apparatus for a cushion layer of a cable, a device, and a storage medium. The method includes: obtaining specification parameters of a corrugated sheath of a to-be-detected cable, calculating a first volume of a cushion layer without deformation and a second volume of a deformed portion of the cushion layer when the cushion layer is deformed under stress, and calculating a stressed-state deformation ratio of the cushion layer based on the first volume and the second volume; obtaining a voltage, a current, an electrode area, an electrode distance, and an initial electrode distance of the cushion layer when the stressed-state deformation ratio is reached, and calculating volume resistivity of the cushion layer; and comparing the volume resistivity with a preset evaluation parameter to obtain a defect detection result of the cushion layer.

Abstract: Defect detection method for a semi-conducting bedding layer of a power cable includes: obtaining a length parameter, a corrugation pitch parameter, radius parameters, and a thickness parameter of a power cable; obtaining a first resistance value between a shield and a corrugated sheath, and calculating a second resistance value of the shield based on the length parameter and the corrugation pitch parameter; calculating a radial resistance value of the semi-conducting bedding layer based on the first resistance value and the second resistance value; determining a contact angle of a critical point of contact between the corrugated sheath and the semi-conducting bedding layer based on the radius parameters and the thickness parameter; calculating volume resistivity of the semi-conducting bedding layer based on the radial resistance value and the contact angle; and comparing the volume resistivity with a preset evaluation parameter to obtain a defect detection result of the semi-conducting bedding layer.

Abstract: Defect detection method for a semi-conducting bedding layer of a power cable includes: obtaining a length parameter, a corrugation pitch parameter, radius parameters, and a thickness parameter of a power cable; obtaining a first resistance value between a shield and a corrugated sheath, and calculating a second resistance value of the shield based on the length parameter and the corrugation pitch parameter; calculating a radial resistance value of the semi-conducting bedding layer based on the first resistance value and the second resistance value; determining a contact angle of a critical point of contact between the corrugated sheath and the semi-conducting bedding layer based on the radius parameters and the thickness parameter; calculating volume resistivity of the semi-conducting bedding layer based on the radial resistance value and the contact angle; and comparing the volume resistivity with a preset evaluation parameter to obtain a defect detection result of the semi-conducting bedding layer.

Abstract: The present disclosure provides a method for fabricating an anti-reflective layer on a quartz surface by using a metal-induced self-masking etching technique, comprising: performing reactive ion etching to a metal material and a quartz substrate by using a mixed gas containing a fluorine-based gas, wherein metal atoms and/or ions of the metal material are sputtered to a surface of the quartz substrate, to form a non-volatile metal fluoride on the surface of the quartz substrate; forming a micromask by a product of etching generated by reactive ion etching gathering around the non-volatile metal fluoride; and etching the micromask and the quartz substrate simultaneously, to form an anti-reflective layer having a sub-wavelength structure.

Abstract: Provided is a method for determining types of ice-and-snow cover. The method includes: determining typical RGB component values of typical types of ice-and-snow cover, establishing a one-to-one corresponding relation between the typical types of ice-and-snow cover and the typical RGB component values, and establishing a database of typical types of ice-and-snow cover; and extracting RGB values of an ice-and-snow covering point from an ice-and-snow cover image of a measurement area, comparing RGB component values of the ice-and-snow covering point with typical RGB component values in the database of typical types of ice-and-snow cover, and determining the type of ice-and-snow cover of the measurement area according to a comparison result.

Abstract: Provided is a method for determining types of ice-and-snow cover. The method includes: determining typical RGB component values of typical types of ice-and-snow cover, establishing a one-to-one corresponding relation between the typical types of ice-and-snow cover and the typical RGB component values, and establishing a database of typical types of ice-and-snow cover; and extracting RGB values of an ice-and-snow covering point from an ice-and-snow cover image of a measurement area, comparing RGB component values of the ice-and-snow covering point with typical RGB component values in the database of typical types of ice-and-snow cover, and determining the type of ice-and-snow cover of the measurement area according to a comparison result.