Patents by Inventor Long-Wen Lin

Long-Wen Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for regulating exhaust pressure in evacuation system of semiconductor process chamber
    Patent number: 6711956
    Abstract: In accordance with the present invention, an apparatus and a method for regulating exhaust pressure in an evacuation system of a semiconductor process chamber are provided. The method comprises steps of generating a first pressure in the semiconductor process chamber with the evacuation system, monitoring the first pressure to generate a first signal, determining a set point for the exhaust pressure responsive to the first signal, and regulating the exhaust pressure by a controller till reaching the set point. The key aspect of the present invention is to maintain the equilibrium of the chamber pressure and the exhaust pressure by implementing an exhaust controller to control the gas flow rate introduced into the evacuation system. In other words, when the chamber pressure is increased, the gas is introduced into the evacuation system at an increased flow rate. On the other hand, when the chamber pressure is decreased, the gas is introduced into the evacuation system at a decreased flow rate.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: March 30, 2004
    Assignee: Macronix International Co., Ltd.
    Inventors: Yu-An Lin, Long-Wen Lin, Wen-Cheng Lai, Chang-Ping Lin
  • Method and apparatus for regulating exhaust pressure in evacuation system of semiconductor process chamber
    Publication number: 20030079550
    Abstract: In accordance with the present invention, an apparatus and a method for regulating exhaust pressure in an evacuation system of a semiconductor process chamber are provided. The method comprises steps of generating a first pressure in the semiconductor process chamber with the evacuation system, monitoring the first pressure to generate a first signal, determining a set point for the exhaust pressure responsive to the first signal, and regulating the exhaust pressure by a controller till reaching the set point. The key aspect of the present invention is to maintain the equilibrium of the chamber pressure and the exhaust pressure by implementing an exhaust controller to control the gas flow rate introduced into the evacuation system. In other words, when the chamber pressure is increased, the gas is introduced into the evacuation system at an increased flow rate. On the other hand, when the chamber pressure is decreased, the gas is introduced into the evacuation system at a decreased flow rate.
    Type: Application
    Filed: October 31, 2001
    Publication date: May 1, 2003
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Yu-An Lin, Long-Wen Lin, Wen-Cheng Lai, Chang-Ping Lin