Abstract: An apparatus for continuous preparation of carbon nanotubes, based on a fluidized bed reactor. The fluidized bed reactor comprises an annular varying diameter zone, a raw material gas inlet, a catalyst feeding port, a protective gas inlet, and a pulse gas controller. The annular varying diameter zone is located at a zone from a ¼ position starting from the bottom to the top. The pulse gas controller is disposed at the arc-shaped top portion of the annular varying diameter zone. The catalyst feeding port is located at the top of the fluidized bed reactor. The raw material gas inlet and the protective gas inlet are located at the bottom of the fluidized bed reactor. The device is also provided with a product outlet and a tail gas outlet.

Abstract: A method of continuously producing carbon nanotubes and hydrogencomprising: preparing a catalyst precursor, and pre-reducing the catalyst precursor; adding a height of carbon nanotubes in a reactor as a stacked bed and electrically heating the carbon nanotubes to the reaction temperature of a vapor deposition furnace in the presence of a protective gas; putting the pre-reduced catalyst or unreduced catalyst precursor into the reactor; under the condition of stirring the solid materials in the reactor, introducing a carbon source gas, reacting same by means of the vapor deposition furnace to generate new carbon nanotubes and hydrogen, continuously discharging a part of carbon nanotubes and a part of hydrogen, and repeating these steps to achieve the continuous preparation of carbon nanotubes. The device has a high utilization rate of raw materials, can manufacture a large batch of carbon nanotubes with a high purity at one time, and is suitable for large-scale industrial production.

Abstract: An apparatus for continuous preparation of carbon nanotubes, based on a fluidized bed reactor. The fluidized bed reactor comprises an annular varying diameter zone, a raw material gas inlet, a catalyst feeding port, a protective gas inlet, and a pulse gas controller. The annular varying diameter zone is located at a zone from a ¼ position starting from the bottom to the top. The pulse gas controller is disposed at the arc-shaped top portion of the annular varying diameter zone. The catalyst feeding port is located at the top of the fluidized bed reactor. The raw material gas inlet and the protective gas inlet are located at the bottom of the fluidized bed reactor. The device is also provided with a product outlet and a tail gas outlet.