Patents by Inventor Longmao YE

Longmao YE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for online and real-time detection of temperature of epitaxial wafer
    Patent number: 10908024
    Abstract: An apparatus and a method for online and real-time detection of a temperature of an epitaxial wafer (4) belong to the technical field of semiconductor detection. The apparatus comprises a MOCVD reaction chamber (1), a light source (6), a beam splitter (7), a reference light detector (8), a reflected light detector (9) and a data acquisition unit (10). The method, on the basis of the apparatus, can obtain a thermal radiation attenuation factor caused by a coating of a reactor chamber window and a reflectance attenuation factor caused by the coating of the reactor chamber window for the epitaxial wafer (4). The apparatus and method can eliminate influence of the coating of the reactor chamber window on an online and real-time temperature detection value, thereby improving the accuracy of the online and real-time temperature detection value.
    Type: Grant
    Filed: August 19, 2014
    Date of Patent: February 2, 2021
    Assignee: AK OPTICS TECHNOLOGY CO., LTD.
    Inventors: Dong Yan, Chengmin Li, Linzi Wang, Jianpeng Liu, Longmao Ye
  • APPARATUS AND METHOD FOR ONLINE AND REAL-TIME DETECTION OF TEMPERATURE OF EPITAXIAL WAFER
    Publication number: 20190346308
    Abstract: An apparatus and a method for online and real-time detection of a temperature of an epitaxial wafer (4) belong to the technical field of semiconductor detection. The apparatus comprises a MOCVD reaction chamber (1), a light source (6), a beam splitter (7), a reference light detector (8), a reflected light detector (9) and a data acquisition unit (10). The method, on the basis of the apparatus, can obtain a thermal radiation attenuation factor caused by a coating of a reactor chamber window and a reflectance attenuation factor caused by the coating of the reactor chamber window for the epitaxial wafer (4). The apparatus and method can eliminate influence of the coating of the reactor chamber window on an online and real-time temperature detection value, thereby improving the accuracy of the online and real-time temperature detection value.
    Type: Application
    Filed: August 19, 2014
    Publication date: November 14, 2019
    Applicant: BEI OPTICS TECHNOLOGY COMPANY LIMITED
    Inventors: DONG YAN, Chengmin LI, Linzi WANG, Jianpeng LIU, Longmao YE