Patents by Inventor Loren A. Haluska

Loren A. Haluska has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5711987
    Abstract: The instant invention pertains to a multi-layer tamper proof electronic coating wherein the first layer is a protecting layer produced from preceramic silicon containing material and at least one filler. The second layer is a resin sealer coat produced from a sealer resin selected from the group consisting of colloidal inorganic-based siloxane resins, benzocyclobutene based resins, polyimide polymers, siloxane polyimides and parylenes. An optional third layer is a cap coating layer selected from SiO.sub.2 coating, SiO.sub.2 /ceramic oxide coating, silicon containing coatings, silicon carbon containing coatings, silicon nitrogen containing coatings, silicon oxygen nitrogen coatings, silicon nitrogen carbon containing coatings and/or diamond like coatings.
    Type: Grant
    Filed: October 4, 1996
    Date of Patent: January 27, 1998
    Assignee: Dow Corning Corporation
    Inventors: Clayton R. Bearinger, Robert C. Camilletti, Loren A. Haluska, Keith W. Michael
  • Patent number: 5635240
    Abstract: The present invention relates to a method of forming coatings on electronic substrates and the substrates coated thereby. The method comprises applying a coating comprising hydrogen silsesquioxane resin and a polysilazane on a substrate and heating the coated substrate at a temperature sufficient to convert the resins to ceramics.
    Type: Grant
    Filed: June 19, 1995
    Date of Patent: June 3, 1997
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5635249
    Abstract: The present invention relates to a method of forming luminescent coatings on substrates and the substrates coated thereby. The method comprises applying a coating comprising hydrogen silsesquioxane resin and a phosphor filler on a substrate and heating the coated substrate at a temperature sufficient to convert the hydrogen silsesquioxane resin to a ceramic coating.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: June 3, 1997
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael, Udo C. Pernisz
  • Patent number: 5611884
    Abstract: A method and composition for joining flip chips back-side-up with respect to substrates by applying an adhesive between the active side of the flip chip and the substrate. The adhesive is a conductive silicone pressure sensitive adhesive containing (i) a silicone resin, (ii) a siloxane gum, (iii) a conductive particulate material, and optionally, (iv) a peroxide catalyst. Suitable conductive particulate materials are silver-clad glass fibers; spherical gold particles; spherical hollow glass microspheres coated with silver, gold, nickel, or copper; or spherical particles of metal alloys of Sn/Cu, Pb/Sn, or Au/Sn. The adhesive can be applied as a ball or bump itself, in conjunction with a solder ball or bump, or in the form of tape sandwiched between the flip chip and substrate.
    Type: Grant
    Filed: December 11, 1995
    Date of Patent: March 18, 1997
    Assignee: Dow Corning Corporation
    Inventors: Clayton R. Bearinger, Robert C. Camilletti, Jack S. Kilby, Loren A. Haluska, Keith W. Michael
  • Patent number: 5540948
    Abstract: Disclosed is a method of forming a coating on a substrate. The method involves coating the substrate with a resinous co-hydrolysate having units of the formula HSi(OH).sub.x (OR).sub.y O.sub.z/2 and Si(OH).sub.a (OR).sub.b O.sub.c/2 in a ratio of 1:3 or less followed by heating the coated substrate to a temperature of between about 50.degree. and about 1000.degree. C.
    Type: Grant
    Filed: March 28, 1995
    Date of Patent: July 30, 1996
    Assignee: Dow Corning Corporation
    Inventor: Loren A. Haluska
  • Patent number: 5541248
    Abstract: A coating composition comprising hydrogen silsesquioxane resin and a phosphor filler diluted in a solvent. These compositions are used to form luminescent coatings on substrates.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: July 30, 1996
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael, Udo C. Pernisz
  • Patent number: 5516596
    Abstract: The present invention relates to a method of forming composite coatings on electronic substrates and the substrates coated thereby. The method comprises applying a coating comprising hydrogen silsesquioxane resin and a refractory fiber on an electronic substrate and heating the coated substrate at a temperature sufficient to convert the hydrogen silsesquioxane resin into a ceramic.
    Type: Grant
    Filed: December 19, 1994
    Date of Patent: May 14, 1996
    Assignee: Dow Corning Corporation
    Inventors: Robert C. Camilletti, Loren A. Haluska, Keith W. Michael
  • Patent number: 5508062
    Abstract: Disclosed is a method of forming a coating on a substrate. The method comprises applying a silane and, optionally, a titanium catalyst, onto the substrate and allowing the silane to hydrolyze and condense with atmospheric moisture to form an insoluble coating.
    Type: Grant
    Filed: December 2, 1994
    Date of Patent: April 16, 1996
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Cecil L. Frye, Harold L. Vincent, Keith D. Weiss
  • Patent number: 5492958
    Abstract: Disclosed is a method of forming metal containing ceramic coatings on substrates. The method comprises applying a coating of hydrogen silsesquioxane resin and a metallic filler onto a substrate and heating the coated substrate at a temperature sufficient to convert the hydrogen silsesquioxane resin to a silica containing ceramic matrix containing the metallic filler.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: February 20, 1996
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5458912
    Abstract: Disclosed is a method of forming tamper-proof coatings on electronic devices. The method comprises applying a coating of a silica precursor resin and a filler onto the electronic device, wherein the filler is one which reacts in an oxidizing atmosphere to liberate enough heat to damage the electronic device. The coated electronic device is then heated at a temperature sufficient to convert the silica precursor resin to a silica containing ceramic matrix.
    Type: Grant
    Filed: August 9, 1993
    Date of Patent: October 17, 1995
    Assignee: Dow Corning Corporation
    Inventors: Robert C. Camilletti, Loren A. Haluska, Keith W. Michael
  • Patent number: 5446088
    Abstract: A method of co-hydrolyzing silanes of the formulas HSi(OR).sub.3 and Si(OR).sub.4 to form a soluble resinous co-hydrolysate is disclosed. The method comprises hydrolyzing the silanes with water in an acidified oxygen containing polar organic solvent. The invention also relates to the soluble co-hydrolysates formed thereby as well as the method of using the co-hydrolysates to provide coatings on various substrates, including electronic devices.
    Type: Grant
    Filed: July 5, 1994
    Date of Patent: August 29, 1995
    Assignee: Dow Corning Corporation
    Inventor: Loren A. Haluska
  • Patent number: 5445894
    Abstract: The present invention relates to the application of ceramic coatings on substrates. The method comprises applying a preceramic coating comprising hydrogen silsesquioxane resin, a material containing Si--Si bonds which forms volatile SiH compounds, and a catalyst followed by pyrolyzing the preceramic coating in an inert atmosphere. The novel ceramic coatings formed by the process of this invention are especially valuable on electronic devices.
    Type: Grant
    Filed: April 22, 1991
    Date of Patent: August 29, 1995
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5436084
    Abstract: The present invention relates to a method of forming coatings on electronic substrates and the substrates coated thereby. The method comprises applying a coating comprising a borosilazane and a filler on a substrate and heating the coated substrate at a temperature sufficient to convert the borosilazane to a ceramic coating.
    Type: Grant
    Filed: April 5, 1994
    Date of Patent: July 25, 1995
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5436083
    Abstract: The present invention relates to a method of forming protective coatings on electronic substrates and the substrates coated thereby. The method comprises applying a coating comprising a polysilazane and a filler on a substrate and heating the coated substrate at a temperature sufficient to convert the polysilazane to a ceramic.
    Type: Grant
    Filed: April 1, 1994
    Date of Patent: July 25, 1995
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5399441
    Abstract: Disclosed is a method of forming opaque coatings on integrated circuits. The method comprises selectively applying a coating of a silica precursor resin and a filler onto the integrated circuit and heating the coated circuit at a temperature sufficient to convert the silica precursor resin to a silica containing ceramic matrix.
    Type: Grant
    Filed: April 12, 1994
    Date of Patent: March 21, 1995
    Assignee: Dow Corning Corporation
    Inventors: Clayton R. Bearinger, Robert C. Camilletti, Loren A. Haluska, Keith W. Michael
  • Patent number: 5387480
    Abstract: Disclosed is a method of forming high dielectric constant coatings on substrates. The method comprises applying a coating of hydrogen silsesquioxane resin and a high dielectric constant filler onto a substrate and heating the coated substrate at a temperature sufficient to convert the hydrogen silsesquioxane resin to a silica containing ceramic matrix containing the filler.
    Type: Grant
    Filed: August 9, 1993
    Date of Patent: February 7, 1995
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5380567
    Abstract: The present invention relates to a method of forming a coating on a substrate in the absence of oxygen. The method comprises coating the substrate with a solution comprising a solvent and hydrogen silsesquioxane resin. The solvent is evaporated and a preceramic coating thereby deposited on the substrate. The preceramic coating is then heated to a temperature of between about 500.degree. up to about 1000.degree. C. under an inert gas atmosphere. The process of the invention is useful for forming protective coatings on any substrate prone to oxidation. The present invention also relates to the formation of additional coatings on the coating formed above.
    Type: Grant
    Filed: June 15, 1993
    Date of Patent: January 10, 1995
    Assignee: Dow Corning Corporation
    Inventor: Loren A. Haluska
  • Patent number: 5358739
    Abstract: A silica coating is formed on an electronic substrate by applying a silazane polymer on the substrate and converting it to silica by heating in an oxidizing environment. The resultant thick planarizing coatings are useful as protective coatings and dielectric inner layers.
    Type: Grant
    Filed: March 10, 1994
    Date of Patent: October 25, 1994
    Assignee: Dow Corning Corporation
    Inventors: Ronald H. Baney, Grish Chandra, Loren A. Haluska
  • Patent number: 5348839
    Abstract: Disclosed are compositions which are useful for forming photodelineable coatings on substrates. The compositions contain a solvent, hydrogen silsesquioxane resin and an initiator which generates free radicals upon exposure to radiation.
    Type: Grant
    Filed: March 22, 1993
    Date of Patent: September 20, 1994
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5336532
    Abstract: A single or multilayer ceramic or ceramic-like coating process is provided which can be applied to heat sensitive substrates such as electronic devices. The process includes the steps of coating the substrate with a solution comprising a hydrogen silsesquioxane resin diluted in a solvent and then evaporating the solvent, thereby depositing a preceramic coating on the substrate. The preceramic coating is then ceramified to a silicon dioxide-containing ceramic by heating the preceramic coating to a temperature of between about 40.degree. to about 400.degree. C. in the presence of ozone which enhances the rate at which the ceramification proceeds and permits the ceramification of the coating to proceed at low temperatures. Additional layers of ceramic materials may be deposited over the initial layer and act as passivating and/or barrier protective layers.
    Type: Grant
    Filed: February 21, 1989
    Date of Patent: August 9, 1994
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael