Patents by Inventor LORINDA ALCANTARA

LORINDA ALCANTARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Drain formulation for enhanced hair dissolution
    Patent number: 10208273
    Abstract: The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.
    Type: Grant
    Filed: October 10, 2016
    Date of Patent: February 19, 2019
    Assignee: The Clorox Company
    Inventors: Rashda Khan, Daniela Fritter, Lorinda Alcantara, Wenyu Zhang, Miranda Helmer
  • Drain formulation for enhanced hair dissolution
    Patent number: 9487742
    Abstract: The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.
    Type: Grant
    Filed: July 24, 2013
    Date of Patent: November 8, 2016
    Assignee: The Clorox Company
    Inventors: Rashda Khan, Daniela Fritter, Lorinda Alcantara, Wenyu Zhang, Miranda Helmer
  • DRAIN FORMULATION FOR ENHANCED HAIR DISSOLUTION
    Publication number: 20140073546
    Abstract: The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.
    Type: Application
    Filed: July 24, 2013
    Publication date: March 13, 2014
    Applicant: The Clorox Company
    Inventors: RASHDA KHAN, DANIELA FRITIER, LORINDA ALCANTARA, WENYU ZHANG, MIRANDA HELMER