Patents by Inventor Loris Scandella

Loris Scandella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6767696
    Abstract: The invention relates to so-called scanning tips of probes necessary for scanning a measured object, in particular in scanning force microscopes and other scanning microscopes, so-called scanning probe microscopes. The possible resolution of such microscopes depends primarily on the fineness of the tip, i.e. its curvature or radius being as small as possible. According to the invention, a photostructurable material, e.g. a photosensitive resists, serves as the material for the scanning tip which is exposed via a mask and is subsequently developed/hardened in a manner known per se. The unexposed parts of the photosensitive resist are removed as usual. By the shape of the exposure mask, the preferably directed exposure of the photosensitive resist, and the subsequent hardening, a tip is formed preferably laterally on or at a carrier, usually made from a different material, which is provided with a very small radius, thus very well suitable for scanning probe microscopy and similar applications.
    Type: Grant
    Filed: June 4, 2001
    Date of Patent: July 27, 2004
    Assignee: Nanosurf AG
    Inventors: Lukas Howald, Loris Scandella, Urs Staufer, Terunobu Akiyama
  • Publication number: 20010050342
    Abstract: The invention relates to so-called scanning tips of probes necessary for scanning a measured object, in particular in scanning force microscopes and other scanning microscopes, so-called scanning probe microscopes. The possible resolution of such microscopes depends primarily on the fineness of the tip, i.e. its curvature or radius being as small as possible. According to the invention, a photostructurable material, e.g. a photosensitive resists, serves as the material for the scanning tip which is exposed via a mask and is subsequently developed/hardened in a manner known per se. The unexposed parts of the photosensitive resist are removed as usual. By the shape of the exposure mask, the preferably directed exposure of the photosensitive resist, and the subsequent hardening, a tip is formed preferably laterally on or at a carrier, usually made from a different material, which is provided with a very small radius, thus very well suitable for scanning probe microscopy and similar applications.
    Type: Application
    Filed: June 4, 2001
    Publication date: December 13, 2001
    Inventors: Lukas Howald, Loris Scandella, Urs Staufer, Terunobu Akiyama