Abstract: The invention relates to the use of a composition comprising a C1 to C6 alkanol and a carboxylic acid ester of formula (I) wherein R1 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; R2 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; X21, X22 are independently selected from C1 to C6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C1 to C6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.

Abstract: Described herein is a non-aqueous composition including (a) an organic solvent, and (b) at least one additive of formulae I, where R1, R2, R3, and R4 are independently selected from C1 to C10 alkyl, C1 to C11 alkylcarbonyl, C6 to C12 aryl, C7 to C14 alkylaryl, and C7 to C14 arylalkyl; and n is 0 or 1.

Abstract: The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.

Abstract: The invention relates to the use of a composition comprising a C1 to C6 alkanol and a carboxylic acid ester of formula (I) wherein R1 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; R2 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; X21, X22 are independently selected from C1 to C6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C1 to C6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.

Abstract: The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH— terminated oligo- or polyalkylene ethers in the presence of the tetra-n-C1-C6-alkoxy-titanate as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

Abstract: The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH-terminated oligo- or polyalkylene ethers in the presence of an alkanesulfonic acid as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

Abstract: The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.

Abstract: The present invention relates to aqueous polymer-silicon oil hybrid compositions in the form of aqueous dispersions of finely divided polymer-silicon oil hybrid particles which comprise at least one water-insoluble polymer P made of ethylenically unsaturated monomers M, at least one surface-active substance and at least non-polymerizable, non-polar silicon oil. The present invention relates in particular to the use of these compositions as additives in aqueous coating and printing ink compositions.

Abstract: The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B]k}n (I).

Abstract: The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH— terminated oligo- or polyalkylene ethers in the presence of the tetra-n-C1-C6-alkoxy- titanate as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

Abstract: The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH-terminated oligo- or polyalkylene ethers in the presence of an alkanesulfonic acid as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

Abstract: The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H2C?C(R1)(C(O)ORF-1)??(I) wherein R1 is H or methyl; and RF-1 is an organic residue containing a perfluorinated C4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H2C?CH(RF-2)??(II) wherein RF-2 is an organic residue containing a perfluorinated C4-6 alkyl group, i.e., —(CF2)3-5—CF3 or any mixture thereof.

Abstract: The present invention relates to aqueous polymer-silicon oil hybrid compositions in the form of aqueous dispersions of finely divided polymer-silicon oil hybrid particles which comprise at least one water-insoluble polymer P made of ethylenically unsaturated monomers M, at least one surface-active substance and at least non-polymerizable, non-polar silicon oil. The present invention relates in particular to the use of these compositions as additives in aqueous coating and printing ink compositions.

Abstract: The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H2C?C(R1)(C(0)ORF-1), wherein R1 is H or methyl; and RF-1 is an organic residue containing a perfluorinated C4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H2C?CH(RF-2) (II) wherein RF-2 is an organic residue containing a perfluorinated C4-6 alkyl group, i.e. —(CF2)3-5—CF3 or any mixture thereof.

Abstract: The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H2C?C(R1)(C(O)ORF?1)??(I) wherein R1 is H or methyl; and RF?1 is an organic residue containing a perfluorinated C4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H2C?CH(RF?2)??(II) wherein RF?2 is an organic residue containing a perfluorinated C4-6 alkyl group, i.e., —(CF2)3-5—CF3 or any mixture thereof.

Abstract: The invention relates to scratch-resistant coatings obtainable by radiative curing, by reaction of (meth)acrylates with mercapto groups, to processes for production thereof and to the use thereof.

Abstract: The invention relates to scratch-resistant coatings obtainable by radiative curing, by reaction of (meth)acrylates with mercapto groups, to processes for production thereof and to use thereof.

Abstract: The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B]k}n (I).

Abstract: The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H2C?C(R1)(C(0)ORF-1), wherein R1 is H or methyl; and RF-1 is an organic residue containing a perfluorinated C4-6alkyl group, a fluorinated alpha-olefin having the following formula (II): H2C?CH(RF-2) (II) wherein RF-2 is an organic residue containing a perfluorinated C4-6 alkyl group, i.e. —(CF2)3-5—CF3 or any mixture thereof.