Abstract: A method for depositing an adhesion-promoting layer on a spatially bounded metallic layer of a silicon chip is provided. The adhesion-promoting layer is deposited, using at least one wet-chemical process. During the wet-chemical process, the concentration of an inhibitor of a multi-component process bath is checked in at least approximately continuous manner and adjusted to a constant value. The adjustment of the inhibitor concentration is independent of the adjustment of the concentrations of other process-bath components.

Abstract: A piezoceramic actuator includes a monolithic stack of thin piezoceramic films having internal electrodes arranged between the films, and rail-like elements electrochemically shaped onto the internal electrodes on outer sides of the stack. The internal electrodes can thereby be interconnected, via a suitable conductive element, in electrically conductive fashion at a certain distance from the side edges of the piezoceramic films so that these films form a continuous planar electrically conductive ribbon.

Abstract: A piezoelectric actuator has a plurality of disks made of piezoelectric material, arranged to form a stack in a stack direction, a plurality of flat inside electrodes arranged in alternation with the disks made of piezoelectric material, and at least two outside electrodes applied to the outside of the stack along the stack direction, the inside electrodes each being connected in alternation to one of the outside electrodes by a contact zone. The outside electrodes are applied to the outside of the stack in the form of a coating of an elastic, electrically conductive polymer material.

Abstract: A method for depositing an adhesion-promoting layer on a spatially bounded metallic layer of a silicon chip is provided. The adhesion-promoting layer is deposited, using at least one wet-chemical process. During the wet-chemical process, the concentration of an inhibitor of a multi-component process bath is checked in at least approximately continuous manner and adjusted to a constant value. The adjustment of the inhibitor concentration is independent of the adjustment of the concentrations of other process-bath components.