Patents by Inventor Lotte Marloes WILLEMS

Lotte Marloes WILLEMS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    Publication number: 20230185990
    Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
    Type: Application
    Filed: January 10, 2023
    Publication date: June 15, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert, Pieter Jacob Mathias Hendrik Knelissen, Stephen Morgan, Maurits Van Der Schaar, Leonardus Henricus Marie Verstappen, Jen-Shiang Wang, Peter Hanzen Wardenier
  • Method and apparatus for inspection and metrology
    Patent number: 11580274
    Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: February 14, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert, Pieter Jacob Mathias Hendrik Knelissen, Stephen Morgan, Maurits Van Der Schaar, Leonardus Henricus Marie Verstappen, Jen-Shiang Wang, Peter Hanzen Wardenier
  • METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    Publication number: 20180046737
    Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
    Type: Application
    Filed: March 24, 2016
    Publication date: February 15, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Lotte Marloes WILLEMS, Kaustuve BHATTACHARYYA, Panagiotis Peter BINTEVINOS, Guangqing CHEN, Martin EBERT, Pieter Jacob Mathias Hendrik KNELISSEN, Stephen MORGAN, Maurits VAN DER SCHAAR, Leonardus Hericus Marie VERSTAPPEN, Jen-Shiang WANG, Peter Hanzen WARDENIER