Patents by Inventor Louis A. Ollivier

Louis A. Ollivier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6450200
    Abstract: A flow control system and method for controlling batchwise delivery of process gas for semiconductor manufacturing are disclosed, wherein the flow control system is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. After the start of the delivering, the pressure drop of the gas in a reference capacity of the system is measured for a measurement period of time while interrupting the flow of process gas from a source of the process gas to the reference capacity and continuing to deliver process gas from the system to a semiconductor manufacturing apparatus at a controlled flow rate. The rate of pressure drop in the reference capacity during the measurement period of time is used as a measure of the actual flow rate. Where the actual flow rate does not agree with a specified flow rate for delivering, the controlled flow rate for a subsequent delivery period of time in which another batch of process gas is delivered, is adjusted.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: September 17, 2002
    Assignee: Parker-Hannifin Corporation
    Inventor: Louis A. Ollivier
  • Publication number: 20020092564
    Abstract: A flow control system and method for controlling batchwise delivery of process gas for semiconductor manufacturing are disclosed, wherein the flow control system is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. After the start of the delivering, the pressure drop of the gas in a reference capacity of the system is measured for a measurement period of time while interrupting the flow of process gas from a source of the process gas to the reference capacity and continuing to deliver process gas from the system to a semiconductor manufacturing apparatus at a controlled flow rate. The rate of pressure drop in the reference capacity during the measurement period of time is used as a measure of the actual flow rate. Where the actual flow rate does not agree with a specified flow rate for delivering, the controlled flow rate for a subsequent delivery period of time in which another batch of process gas is delivered, is adjusted.
    Type: Application
    Filed: February 6, 2002
    Publication date: July 18, 2002
    Inventor: Louis A. Ollivier
  • Patent number: 6363958
    Abstract: A flow control system and method for controlling batchwise delivery of process gas for semiconductor manufacturing are disclosed, wherein the flow control system is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. After the start of the delivering, the pressure drop of the gas in a reference capacity of the system is measured for a measurement period of time while interrupting the flow of process gas from a source of the process gas to the reference capacity and continuing to deliver process gas from the system to a semiconductor manufacturing apparatus at a controlled flow rate. The rate of pressure drop in the reference capacity during the measurement period of time is used as a measure of the actual flow rate. Where the actual flow rate does not agree with a specified flow rate for delivering, the controlled flow rate for a subsequent delivery period of time in which another batch of process gas is delivered, is adjusted.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: April 2, 2002
    Assignee: Parker-Hannifin Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 6363959
    Abstract: A fluid pressure regulator and method of operating the same particularly adapted for use in alternating flow and no flow modes as in the batchwise delivery of pressurized gases used in semiconductor manufacture. Such pressure regulator and method include a controlled differential pressure setting capability which provides for the application of a differential pressure setting force independently of a main pressure setting force. As a result, operation of the pressure regulator may be controlled to obviate pressure creep at the regulator outlet.
    Type: Grant
    Filed: April 19, 2000
    Date of Patent: April 2, 2002
    Assignee: Parker-Hannifin Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 6328054
    Abstract: A balanced fluid pressure regulator of the disclosed embodiment comprises a balancing bellows inside a sensing bellows to minimize the supply pressure effect for improved performance while reducing the size and weight of the regulator in comparison to a conventional regulator. A sensing duct communicates the enclosed space between the bellows with the fluid passage of the regulator downstream from a poppet valve. The cross-sectional area of the fluid passage is reduced in the vicinity of the sensing duct for decreasing the pressure in the enclosed space at high gas flow rates. The valve seat in the regulator is supported so it is free to move during assembly of the regulator to self-align the seat with the poppet valve.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: December 11, 2001
    Assignee: Parker-Hannifin Corporation-Veriflo division
    Inventors: Richard L. Martin, Louis A. Ollivier
  • Patent number: 6003535
    Abstract: An improved continuously variable micro control valve and an apparatus and a method employing the same for making semiconductors enable a computer to precisely set a driver of the micro control valve such that the accuracy of the control valve in reproducing a flow value for a given setting of the driver is at least 1/1000 of a maximum flow value for a relatively wide range of flow values which can be provided by the micro control valve. The relatively wide range of flow values is at least 1000 to 1 in a disclosed embodiment with a resolution sensitivity of the micro control valve being at least 1/10,000 of the full scale of the relatively wide range of flow values. The improvement in repeatability and accuracy afforded by the micro control valve can result in higher yields in semiconductor making.
    Type: Grant
    Filed: May 7, 1996
    Date of Patent: December 21, 1999
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5787925
    Abstract: A pneumatically servoed gas pressure regulator capable of providing a relatively wide range of gas flow rates with precision outlet pressure control includes a dome loaded gas pressure regulator and a pressure sensor controller integrated in a single unit. The controller senses the regulator outlet gas pressure, compares it to a pressure setting of the controller, and operates a pneumatic servo valve of the controller for generating a control signal dome gas pressure for the dome loaded gas pressure regulator as a function of the deviation between the sensed outlet pressure and the pressure setting of the controller, independently of the gas through flow rate. A relatively large change in the size of the valved passage in the regulator is made with only a relatively small deviation of less than or equal to a few psi between the sensed outlet pressure and the pressure setting of the controller. The relatively large change in the size of the passage in the regulator effectively uses the entire flow capacity C.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: August 4, 1998
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5762086
    Abstract: An apparatus free of polymer material in contact with process gas for delivering process gas for making semiconductors includes a pressure regulator for regulating the pressure of the process gas to be delivered by the apparatus from a supply of pressurized process gas. The pressure regulator has a first valve seat and a first valve which cooperates with the first valve seat for controlling the flow of process gas through the regulator. Both the first valve seat and the first valve are formed of metal. The apparatus further includes a second valve having metal-to-metal dynamic seating for controlling the flow of the gas from the supply to the regulator. The second valve is provided immediately upstream of the pressure regulator along a flow path for the gas through the apparatus. A relatively high creep of the pressure regulator is significantly reduced by operating the regulator in conjunction with the pneumatically operated (on/off) second valve.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: June 9, 1998
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5755428
    Abstract: A valve having metal-to-metal dynamic seating for controlling the flow of gas includes a valve body having a gas passage extending therethrough, a metal seat extending about the gas passage, a flexible metal diaphragm mounted in the valve so the diaphragm can be moved into and out of sealing contact with the metal seat to respectively close and open the gas passage, and an actuator operable for opening and closing the gas passage by way of movement of the diaphragm relative to the metal seat. The actuator includes a metal backing member forcedly contacting the diaphragm during closing of the gas passage on a side of the diaphragm opposite a side thereof which makes sealing contact with the metal seat. The metal seat and the metal backing member are configured such that the sealing contact between the metal diaphragm and the metal seat is a relatively narrow line of contact extending about the gas passage.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: May 26, 1998
    Assignee: Veriflow Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5732736
    Abstract: A fluid pressure regulator and a method of regulating involve configuring a valve and valve seat of the regulator such that as the valve is moved relative to the valve seat from a closed or nearly closed position of a throttled fluid passage in the regulator to a full flow position, the throttled fluid passage is opened at a rate in relation to the movement of the valve relative to the valve seat which increases during travel of the valve. In one disclosed form of the fluid pressure regulator, a first portion of the outer surface of the valve which contacts the valve seat when the valve closes the throttled fluid passage is tapered with respect to a direction of movement of the valve relative to the valve seat.
    Type: Grant
    Filed: March 18, 1996
    Date of Patent: March 31, 1998
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5458001
    Abstract: A gas pressure regulator and a diaphragm assembly therefor and a method of assembling the regulator utilizing the diaphragm assembly which enable the precise alignment of a diaphragm and a valve carried thereby with respect to a valve seat for improved regulator performance with predictable relatively low hysteresis and creep, and improved reproducibility in a regulator of relatively small size.
    Type: Grant
    Filed: August 31, 1993
    Date of Patent: October 17, 1995
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 5230359
    Abstract: A fluid pressure regulator and method of regulating high pressure fluid from a container such as high pressure gas cylinder, compensate for variation in the supply pressure to the regulator to limit variation in the outlet pressure of the regulator due to supply pressure variations. A flexible valve seat of the regulator is mounted in the regulator so that the seat can flex in response to changes in the supply pressure to change the operating point of the valve seat concurrently with changes in the balance of forces on a diaphragm of the regulator caused by changes in the supply pressure to the regulator. Advantageously, the regulator and method eliminate the need for using two stage regulators for minimizing outlet pressure variations due to the supply pressure effect.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: July 27, 1993
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 4702277
    Abstract: A cylinder valve for mounting on a high pressure gas cylinder for remotely controlling the flow of gas from the cylinder. The cylinder valve is resistant to hazardous gases and includes a fluid passage for conveying gas through the cylinder valve from an inlet for communicating with the high pressure gas cylinder to an outlet. A first valve is provided for opening and closing the fluid passage to control the flow of gas through the fluid passage. A pneumatically operated actuator is provided for operating the first valve in response to the application of an external control pressure to the actuator. A mechanism is provided to move the first valve and close the fluid passage in the event of loss of external control pressure to the actuator. A second valve is located downstream of the first valve in the vicinity of the outlet. The second valve is biased to close the fluid passage but is moved to open the passage in response to attachment of a connector to the outlet of the cylinder valve.
    Type: Grant
    Filed: December 2, 1986
    Date of Patent: October 27, 1987
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 4471803
    Abstract: A flow limit shutoff valve for automatically shutting off all flow between a source of high-pressure gas and a pressure regulator when that flow exceeds a preset flow rate. The flow to the shutoff valve is metered, resulting in lowering the pressure downstream from a metering valve. A main valve has a first chamber on one side downstream from the metering valve, and the valve's outlet is connected to this first chamber. A second chamber on the opposite side is connected to the inlet pressure. The main valve is biased in the opposite direction from that urged by the inlet pressure, so as normally to keep it open, but the main valve snaps shut when the inlet pressure forces overcome the sum of the downstream gas pressure forces and the biasing forces. To enable reopening, a bypass system connects the upstream side of metering valve to the first chamber, while there is a manually operated closure for manually opening and closing off the bypass to the first chamber.
    Type: Grant
    Filed: March 8, 1982
    Date of Patent: September 18, 1984
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 4257450
    Abstract: In a pressure-reducing regulator valve for high-pressure gases, the diaphragm is linked to the movable valve member controlling the flow of gas between the high-pressure inlet and the regulated outlet. The linkage is done through a lost-motion connection so that the diaphragm can be set to deflect by a nominal amount from its relaxed position at the time that it starts to open the valve seat assembly and can be slightly deflected from its relaxed position to pull the valve against the seat of the valve seat assembly. Sealing prevents leakage through the diaphragm assembly.
    Type: Grant
    Filed: June 1, 1979
    Date of Patent: March 24, 1981
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier
  • Patent number: 3973579
    Abstract: Apparatus for controlling the flow ratio of two gases, such as carbon dioxide and air or oxygen, where the principal gas is subject to flow fluctuations and the second gas is added to it at a ratio which is to be kept constant despite the variations in flow of the first gas. From the upstream side of a fixed orifice in a main conduit, the first gas is conducted to a sealed chamber on one side of a very flexible diaphragm. The second gas is conducted to the other side of the diaphragm which serves, in conjunction with a valve controlled by the diaphragm, to equate the pressure of the second gas exactly to that of the first gas. An outlet from the pressure regulator leads to the inlet of a flow control valve, and the outlet of the flow control valve leads back to the main conduit to a point downstream from the fixed orifice.
    Type: Grant
    Filed: June 6, 1974
    Date of Patent: August 10, 1976
    Assignee: Veriflo Corporation
    Inventor: Louis A. Ollivier