Patents by Inventor Louis C. Frees
Louis C. Frees has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090014644Abstract: An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.Type: ApplicationFiled: July 10, 2008Publication date: January 15, 2009Applicant: Inficon, Inc.Inventors: Chenglong Yang, Jeffrey P. Merrill, Louis C. Frees, Steven J. Lakeman
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Patent number: 7041984Abstract: A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby increasing the effective life of the anode without premature replacement or repair.Type: GrantFiled: May 20, 2004Date of Patent: May 9, 2006Assignee: Inficon, Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Patent number: 6740195Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: GrantFiled: August 30, 2002Date of Patent: May 25, 2004Assignee: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6642641Abstract: An apparatus for determining both total and partial pressures of a gas using one common electron beam includes a partial pressure ionization region and a total pressure ionization region separated by a grid or aperture. A filament produces a plurality of electrons which are focused into an electron beam by a repeller and an aperture or an anode. The interaction between the electron beam and molecules of the gas within the partial pressure and total pressure regions produces first and second ion streams. A focus plate is biased such that the first ion stream is directed to an analyzer which calculates the partial pressure of the gas. An ion collector collects the ions from the second ion stream, where the resulting reference current is used to determine the total pressure of the gas.Type: GrantFiled: April 19, 2001Date of Patent: November 4, 2003Assignee: Inficon, Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Publication number: 20030008422Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: ApplicationFiled: August 30, 2002Publication date: January 9, 2003Applicant: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6476612Abstract: In an ionization gauge, the effect of X-rays emitted when a collimated electron beam strikes grid surfaces in the gauge structure is reduced by a louvered beam stop. The louvered beam stop creates shadow regions having no X-rays, thus minimizing the amount of X-rays striking the collector plate and reducing the X-ray effect portion of the residual current.Type: GrantFiled: April 19, 2001Date of Patent: November 5, 2002Assignee: Inficon Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Publication number: 20020153820Abstract: An apparatus for determining both total and partial pressures of a gas using one common electron beam includes a partial pressure ionization region and a total pressure ionization region separated by a grid or aperture. A filament produces a plurality of electrons which are focused into an electron beam by a repeller and an aperture or an anode. The interaction between the electron beam and molecules of said gas within the partial pressure and total pressure regions produces first and second ion streams. A focus plate is biased such that the first ion stream is directed to an analyzer which calculates the partial pressure of the gas. An ion collector collects the ions from the second ion stream, where the resulting reference current is used to determine the total pressure of the gas.Type: ApplicationFiled: April 19, 2001Publication date: October 24, 2002Applicant: Inficon Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Patent number: 6468814Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: GrantFiled: July 21, 1999Date of Patent: October 22, 2002Assignee: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6091068Abstract: An ion collector includes a Faraday collector having a conductive surface disposed substantially parallel to and spaced from the axis of an entering particle beam containing charged and uncharged particles. A grounded plate disposed in the path of the particle beam allows incoming uncharged particles to impinge thereupon. Preferably, the application of a suitable potential to the conductive plate manipulates incoming charged ions to impinge upon either the electron multiplier or the Faraday collector. The ion collector can further include an electron multiplier used in conjunction with the Faraday collector to allow separate modes of operation. Application of a suitable first potential to the electron multiplier can cause charged particles to be deflected directly to the Faraday collector in one mode, and application of a second potential can cause deflection of charged particles to the electron multiplier, with the effects of the uncharged particles on the output of the detector being minimized.Type: GrantFiled: May 4, 1998Date of Patent: July 18, 2000Assignee: Leybold Inficon, Inc.Inventors: William E. Parfitt, Timothy L. Karandy, Louis C. Frees, Robert E. Ellefson
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Patent number: 5834770Abstract: A mass spectrometer gas analyzer includes an ion source for producing ions of a sample gas in a defined ion volume. An ion analyzer collects and analyzes a first portion of the produced ions to determine a partial pressure for a selected gas species within the sample gas. An oppositely disposed ion collector collects a second portion of the ions to determine a total pressure of the contained gas sample. A collecting surface of the ion collector is positioned relative to the incoming ion beam to allow collection of ion current but the surface is configured such that a substantial portion of a plurality of secondary electrons produced by ion bombardment with the ion collector are deflected away from the ionization volume. The partial pressure is thus determined by the ion analyzer without secondary electrons entering the ion analyzer.Type: GrantFiled: July 11, 1997Date of Patent: November 10, 1998Assignee: Leybold Inficon, Inc.Inventors: David H. Holkeboer, Louis C. Frees