Patents by Inventor Louis C. Poli

Louis C. Poli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5446307
    Abstract: A pyramid shaped etch is made in an n or p type silicon substrate, or any symmetric etch with slanted edges, with p or n type implants in the slanted edges of the etch to form a PN junction. On this structure, an emitter and two collectors are formed by further implanting n+ regions in the PN junction region. To complete the device, ohmic contacts are formed to establish a base region. In operation, an appropriate bias is applied to the emitter through to the base and collectors. By so biasing the device, the device operates as a standard bipolar transistor. The currents of both the minority and majority carriers in the base region will respond to the component of the magnetic field perpendicular to the face of the slanted etch. As a result, there will be a difference in the currents in the collectors. These currents can then be simply calibrated to measure the magnetic field component.
    Type: Grant
    Filed: November 4, 1994
    Date of Patent: August 29, 1995
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Robert A. Lux, James F. Harvey, Charles D. Mulford, Jr., Louis C. Poli
  • Patent number: 4821093
    Abstract: A multi-terminal Group III-V semiconductor high electron mobility field effect transistor comprised of a sandwich of molecular beam epitaxially grown layers and including two high mobility charge flow channels in respective two dimensional electron gas regions implemented, for example, by at least one doped layer of aluminum gallium arsenide adjacent an undoped gallium arsenide layer separated by a heterojunction. A pair of opposing two dimensional electron gas (2DEG) regions are generated in the layer of undoped gallium arsenide by the bending of the energy levels of the semiconductor materials. Charge flow occurs in a unidirectional fashion from one channel to the other in the common undoped gallium arsenide layer under the control of an electric field applied transversely through the structure by means of a top gate electrode and a bottom field plate electrode.
    Type: Grant
    Filed: July 29, 1988
    Date of Patent: April 11, 1989
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Gerald J. Iafrate, Louis C. Poli, Thomas Aucoin, Linda S. Heath
  • Patent number: 4549293
    Abstract: A covert line of sight time division multiple access communications system omprised of a plurality of geographically separated transceivers consisting of identical hardware and capable of operating either as a master station or a slave station, and when desirable as a repeater station. The system operates with a non-committed master station operating within a predetermined power circle of operation whereby multiple slave stations and/or repeaters communicate with each other by way of the master station in a one half duplex mode at a single frequency in the millimeter wave frequency range between 54 and 58 GHz.
    Type: Grant
    Filed: December 29, 1983
    Date of Patent: October 22, 1985
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: J. Robert Christian, Louis C. Poli