Patents by Inventor Louis Henaff

Louis Henaff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Installation for depositing thin layers in the reactive vapor phase
    Patent number: 4434742
    Abstract: Installation for the deposition of thin layers in the reactive vapor phase by plasma.The installation comprises a coaxial conductor, whose core is hollow and is used for introducing gas into a chamber having a row of openings. The conductor is also used for introducing the high frequency field necessary for exciting the gas. A substrate or sample holder moves beneath the row of openings.Application to the deposition of thin layers with a large surface.
    Type: Grant
    Filed: September 22, 1982
    Date of Patent: March 6, 1984
    Inventors: Louis Henaff, Michel Morel, Jean L. Favennec