Abstract: A method including poling an optical waveguide device including an optical waveguide core, an electrode, and an organically modified sol-gel layer.

Abstract: Electro-optic waveguide devices that comprise an electro-optic polymer core and a polymer buffer clad. The polymer buffer clad comprises an organically modified sol-gel and has a refractive index lower than the refractive index of the core.

Abstract: A device that comprises: a) a first optical waveguide; b) a second optical waveguide; c) an optical coupling region including the first and second optical waveguides, the optical coupling region characterized as having at least one coupling length and comprising a first bias section, a modulation section, and a second bias section arranged such that light propagates serially through the first bias section, the modulation section, and the second bias section; d) a first bias electrode for biasing the first bias section; e) a modulating electrode for applying a modulating voltage to the modulation section, the modulating electrode being positioned to control the refractive index of the first optical waveguide; and f) a second bias electrode for biasing the second bias section.

Abstract: An electro-optic waveguide device that includes (a) an electro-optic polymer core having a refractive index and (b) an electro-optic first polymer clad in proximity to the electro-optic polymer core.

Abstract: A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.

Abstract: An electro-optic waveguide device, comprising (a) a first polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 ?m to about 3.2 ?m; (b) a first polymer clad having a refractive index of about 1.53 to about 1.61 and a thickness of about 1.0 ?m to about 3.0 ?m; (c) an electro-optic polymer core having a refractive index of about 1.54 to about 1.62 and a thickness of about 1.0 ?m to about 3.0 ?m; and (d) a second polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 ?m to about 3.2 ?m.

Abstract: A method of fabricating a polymer waveguide, comprising (a) forming a first polymer film in proximity to a substrate, the first polymer film comprising a nonlinear optical chromophore; (b) poling and crosslinking the first polymer film to provide a crosslinked first electro-optic polymer film; (c) forming a second polymer film comprising a nonlinear optical chromophore in proximity to the first electro-optic polymer film; and (d) poling the second polymer film to provide a second electro-optic polymer film.

Abstract: An electro-optic waveguide device that includes (a) an electro-optic polymer core having a refractive index and (b) an electro-optic first polymer clad in proximity to the electro-optic polymer core.

Abstract: An electro-optic waveguide device, comprising (a) a first polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &mgr;m to about 3.2 &mgr;m; (b) a first polymer clad having a refractive index of about 1.53 to about 1.61 and a thickness of about 1.0 &mgr;m to about 3.0 &mgr;m; (c) an electro-optic polymer core having a refractive index of about 1.54 to about 1.62 and a thickness of about 1.0 &mgr;m to about 3.0 &mgr;m; and (d) a second polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &mgr;m to about 3.2 &mgr;m.

Abstract: Electro-optic waveguide devices that comprise an electro-optic polymer core and a polymer buffer clad. The polymer buffer clad comprises an organically modified sol-gel and has a refractive index lower than the refractive index of the core.

Abstract: A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.