Abstract: The invention comprises a method and apparatus for determining state of a positively charged particle, such as a proton, for use in imaging a tumor of a patient prior to and/or concurrent with cancer therapy. The imaging system comprises: (1) a beam transport path of the positively charged particle sequentially passing through a patient, through a first time of flight detector, and, after traversing a pathlength, at least into a second time of flight detector and (2) a beam state determination system using elapsed time between detection at the first and second time of flight detectors and the pathlength to determine a residual beam energy, which, when compared to a known incident beam energy, is used in generation of an image of the tumor. An optional beam energy degrading element increases time differences between the time of flight detectors.

Abstract: Methods for maintaining a specified beam profile of an x-ray beam extracted from an x-ray target over a large range of extraction angles relative to the target. A beam of electrons is generated and directed toward a target at an angle of incidence with respect to the target, with the beam of electrons forming a focal spot corresponding to the cross-section of the electron beam. At least one of a size, shape, and orientation of the electron beam cross-section is dynamically varied as the extraction angle is varied, and the extracted x-ray beam is collimated. Dynamically varying the size, shape or orientation of the electron beam cross-section may be performed using focusing and stigmator coils.

Abstract: Methods for maintaining a specified beam profile of an x-ray beam extracted from an x-ray target over a large range of extraction angles relative to the target. A beam of electrons is generated and directed toward a target at an angle of incidence with respect to the target, with the beam of electrons forming a focal spot corresponding to the cross-section of the electron beam. At least one of a size, shape, and orientation of the electron beam cross-section is dynamically varied as the extraction angle is varied, and the extracted x-ray beam is collimated. Dynamically varying the size, shape or orientation of the electron beam cross-section may be performed using focusing and stigmator coils.

Abstract: A contamination mitigation or surface modification system for ion implantation processes includes a gas source, a controller, a valve, and a process chamber. The gas source provides delivery of a gas, be it atmospheric or reactive, to the valve and is controlled by the controller. The valve is located on or about the process chamber and controllably adjusts flow rate and/or composition of the gas to the process chamber. The process chamber holds a target device, such as a target wafer and permits interaction of the gas with an ion beam to mitigate contamination of the target wafer and/or to modify the existing properties of the processing environment or target device to change a physical or chemical state or characteristic thereof. The controller selects and adjusts composition of the gas and flow rate according to contaminants present within the ion beam, or lack thereof, as well total or partial pressure analysis.

Abstract: The present invention is directed to a method and apparatus for providing a uniform ion implantation in a single-workpiece two-dimensional mechanical scanning ion implantation system, wherein the transient temperature operating parameter is controlled based on mechanical rotation of the workpiece by a predetermined amount between two or more scans of the workpiece through a fixed ion beam. Rotating the workpiece between scans through the fixed ion beam allows for the transient temperature to decay sufficiently for more uniform ion implantation processes to proceed.