Patents by Inventor Lowell Lane BAKER
Lowell Lane BAKER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11237490Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.Type: GrantFiled: January 26, 2017Date of Patent: February 1, 2022Assignee: ASML Netherlands B.V.Inventors: Bearrach Moest, Lowell Lane Baker, James Robert Downes, Wijnand Hoitinga, Hermen Folken Pen
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Patent number: 10642166Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: July 22, 2019Date of Patent: May 5, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Patent number: 10585359Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.Type: GrantFiled: July 17, 2017Date of Patent: March 10, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter Albright, Lowell Lane Baker, Daniel Nathan Burbank
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Publication number: 20190346777Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: July 22, 2019Publication date: November 14, 2019Applicants: ASML NETHERLANDS B. V., ASML HOLDING N. V.Inventors: Günes NAKÍBOGLU, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergun CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Patent number: 10394139Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: March 8, 2017Date of Patent: August 27, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nak{dot over (i)}bo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20190171119Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.Type: ApplicationFiled: July 17, 2017Publication date: June 6, 2019Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter ALBRIGHT, Lowell Lane BAKER, Daniel Nathan BURBANK
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Publication number: 20190121248Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: March 8, 2017Publication date: April 25, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Günes NAKIBOGLU, Lowell Lane BAKER, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergün CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Publication number: 20190079420Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.Type: ApplicationFiled: January 26, 2017Publication date: March 14, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Bearrach MOEST, Lowell Lane BAKER, James Robert DOWNES, Wijnand HOITINGA, Hermen Folken PEN