Patents by Inventor Lu Lang

Lu Lang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230341598
    Abstract: The present invention provides a surface light source projection device with improved zero-order diffraction, which includes a light exit module and a diffractive optical module. Wherein, the diffractive optical module has two micron diffractive layers, the micron diffractive layers include a plurality of microstructures, and the microstructures are provided with a first recess, and the first recess has a first depth and a first outer diameter. The outer diameter of the microstructures is between 5 times and 200 times the incident wavelength of the narrow half-wave width, and the first outer diameter of the first recess is between 0.3 and 0.7 times the outer diameter. As such, a surface light source projection device that can generate a diffraction pattern with uniform spot intensity and can illuminate for a long time is provided.
    Type: Application
    Filed: June 16, 2022
    Publication date: October 26, 2023
    Inventors: Jun-Wen CHUNG, Hsu-Wen Fu, Lu-Lang HSU
  • Publication number: 20230244008
    Abstract: The present invention provides a surface light source projection device, which includes a light emitting module and a diffractive optical module. Wherein, the diffractive optical module has two micron diffractive layers, the micron diffractive layers include a plurality of micron structures, and the shape of the micron structures is set to be cone, disc or any combination of the above. The micron structures have an outer diameter, and the outer diameter of the micron structures is between 5 times and 200 times of the Narrow half-wave width incident wavelength of the light beam output from the light emitting module. Thereby, the surface light source projection device capable of enduring heat accumulation generated after continuous irradiation of high-energy laser is provided to facilitate long-term irradiation and long-distance sensing.
    Type: Application
    Filed: April 27, 2022
    Publication date: August 3, 2023
    Inventors: Jun-Wen CHUNG, Hsu-Wen Fu, Lu-Lang HSU
  • Publication number: 20230119978
    Abstract: The invention provides a biomolecular image sensor with a plurality of microstructures repeatedly arranged on a surface of an image sensing element, and method thereof for detecting biomolecule.
    Type: Application
    Filed: April 28, 2022
    Publication date: April 20, 2023
    Inventors: Ping-Hung Yin, Chun-I Shao, Hsiao-Wen Sun, Hsu-Wen Fu, Chang-Hsien Tsai, Lu-Lang Hsu
  • Publication number: 20210307838
    Abstract: A surgical navigation method and system (100). The method comprises: optically positioning an ultrasonic probe and puncture needle having been configured with an optical mark piece (S603); acquiring ultrasonic imaging data acquired in real time by the ultrasonic probe (S604); generating a position and trajectory of the puncture needle in an ultrasonic image according to optical positioning information and the ultrasonic imaging data (S605); and synchronously displaying the ultrasonic image, and the position and trajectory of the puncture needle in the ultrasonic image (S606). The system (100) comprises a positioning module (201), an ultrasonic imaging data acquisition module (202), a puncture needle trajectory generation module (203) and a display module (204).
    Type: Application
    Filed: December 29, 2017
    Publication date: October 7, 2021
    Inventors: Yan Xia, Pu WANG, Lu Lang
  • Publication number: 20030062346
    Abstract: A method of vacuum holes formation on carrier film of chemical mechanical polishing machine; the formed vacuum is to fit the dimension and position of vacuum hole on the wafer carrier of the chemical mechanical polishing machine. The present invention is that providing a formed plate and a mold for fixing and positioning, and then adjusting to produce the best laser parameters, thus forming vacuum hole of need of carrier film on chemical polishing machine via laser machine.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 3, 2003
    Applicant: ASIA IC MIC-PROCESS, Inc.
    Inventors: Sheng-Hun Jeng, Lu-Lang Hsu
  • Publication number: 20030022594
    Abstract: A polishing assistant system applied to a polished wafer polished by a chemical mechanical polishing (CMP) is disclosed. The polishing assistant system includes a monitoring device for detecting a first polishing parameter of the polished wafer, and a polishing assistant apparatus. The polishing assistant apparatus further includes a platen for placing the polished wafer, a liquid supplier for supplying a slurry, a polishing controller for receiving the first polishing parameter and outputting a first control signal which is relative to a certain region of the polished wafer in response to the first polishing parameter, and a polish head electrically connected to the polishing controller and polishing the certain region of the polished wafer in response to the first control signal.
    Type: Application
    Filed: October 26, 2001
    Publication date: January 30, 2003
    Applicant: Winbond Electronics Corp.
    Inventors: Chi-Hung Lee, Liang-Kuei Chou, Ting-Kuo Chen, Lu-Lang Hsu