Patents by Inventor Lu-Yi Yang

Lu-Yi Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080042565
    Abstract: A structure of plasma display panel includes a first panel and a second panel wherein the auxiliary electrode of the first panel is formed of multiple conductors that are arranged in pair on each pair of transparent electrodes and electrically connected with the transparent electrodes. In addition., the spacing of blue subpixel area corresponding to the auxiliary electrode is larger than that of the red or green subpixel area corresponding to the auxiliary electrode. Via enlarging the spacing of blue subpixel area corresponding to the auxiliary electrode, the aperture ratio and the light-emitting area of blue subpixel is increased, and thus, the object of raising the color temperature of the plasma display panel is achieved.
    Type: Application
    Filed: August 18, 2006
    Publication date: February 21, 2008
    Applicant: Chunghwa Picture Tubes, Ltd.
    Inventor: Lu-Yi Yang
  • Publication number: 20070096652
    Abstract: A method for fabricating a step-formed patterned layer is provided. First, a first patterned photo-resist dry film is formed on a first material layer. Next, a second material layer is formed on the first material layer and covers the first patterned photo-resist dry film. A second patterned photo-resist dry film is then formed on a second material layer, and the patterns of the first patterned photo-resist dry film and the second patterned photo-resist dry film are different and the second patterned photo-resist dry film further exposes the second material layer over the first patterned photo-resist dry film. Subsequently, the first material layer and the second material layer are partially removed by using the first patterned photo-resist dry film and the second patterned photo-resist dry film as a mask. The first patterned photo-resist dry film and the second patterned photo-resist dry film are then removed.
    Type: Application
    Filed: October 28, 2005
    Publication date: May 3, 2007
    Inventors: Chao-Jen Chang, Wen-Yu Liu, Chien-Hsiu Hsu, Lu-Yi Yang
  • Publication number: 20050084805
    Abstract: A method for forming a patterned ITO structure by using a photosensitive ITO solution is provided. By mixing both the ITO and photosensitive material to form a photosensitive ITO solution on a substrate, a patterned ITO structure is available by directly exposing and developing the photosensitive ITO layer. Significantly, no photo-resist layer is required.
    Type: Application
    Filed: October 20, 2003
    Publication date: April 21, 2005
    Inventors: Lu-Yi Yang, Ching-Chung Cheng, Yen-Ting Shen, Yuan-Chi Lin