Patents by Inventor Luberthus Ouwehand
Luberthus Ouwehand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7751059Abstract: A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal.Type: GrantFiled: June 5, 2006Date of Patent: July 6, 2010Assignee: ASML Netherlands B.V.Inventors: Nicolaas Antonius Allegondus Johannes Van Asten, Oana Cristina Balan, Luberthus Ouwehand, Machiel Jacobus Johannes Viguurs, Alexander Charles Franciscus Anna Van Well, Lun Kai Cheng, Huibert Blokland, Elke Van Loenhout, Hans Baltus Bakker
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Patent number: 7542127Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.Type: GrantFiled: December 21, 2005Date of Patent: June 2, 2009Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Nicolaas Antonius Allegondus Johannes Van Asten, Wilhelmus Josephus Box, Tjarko Adriaan Rudolf Van Empel, Leon Martin Levasier, Erik Roelof Loopstra, Marcel Johannus Elisabeth Hubertus Muitjens, Luberthus Ouwehand, Leon Joseph Marie Van Den Schoor, Marcel Beckers, Rob Jansen, Elke Van Loenhout
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Publication number: 20080309915Abstract: The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area.Type: ApplicationFiled: August 8, 2008Publication date: December 18, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Antonius Allegondus Johannes Van Asten, Oana Cristina Balan, Luberthus Ouwehand, Machiel Jacobus Johannes Viguurs, Alexander Charles Franciscus Anna Van Well, Lun Kai Cheng, Huibert Blokland, Elke Van Loenhout, Hans Baltus Bakker
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Patent number: 7411667Abstract: The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area.Type: GrantFiled: October 18, 2005Date of Patent: August 12, 2008Assignee: ASML Netherlands B.V.Inventors: Nicolaas Antonius Allegondus Johannes Van Asten, Oana Cristina Balan, Luberthus Ouwehand, Machiel Jacobus Johannes Viguurs, Alexander Charles Franciscus Anna Van Well, Lun Kai Cheng, Huibert Blokland, Elke Van Loenhout, Hans Baltus Bakker
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Patent number: 7333174Abstract: A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table.Type: GrantFiled: December 27, 2005Date of Patent: February 19, 2008Assignee: ASML Netherlands, B.V.Inventors: Willem Herman Gertruda Anna Koenen, Arthur Winfried Eduardus Minnaert, Luberthus Ouwehand, Johannes Mathias Theodorus Antonius Adriens, Wouter Onno Pril
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Publication number: 20070139629Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.Type: ApplicationFiled: December 21, 2005Publication date: June 21, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Sengers, Nicolaas Johannes Van Asten, Wilhelmus Box, Tjarko Van Empel, Leon Levasier, Erik Loopstra, Marcel Hubertus Muitjens, Luberthus Ouwehand, Leon Van Den Schoor, Marcel Beckers, Rob Jansen, Elke Van Loenhout
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Publication number: 20070013915Abstract: A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal.Type: ApplicationFiled: June 5, 2006Publication date: January 18, 2007Applicant: ASML Netherlands B.V.Inventors: Nicolaas Antonius Allegondus Van Asten, Oana Balan, Luberthus Ouwehand, Machiel Jacobus Viguurs, Alexander Charles Van Well, Lun Cheng, Huibert Blokland, Elke Loenhout, Hans Bakker
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Publication number: 20060274324Abstract: The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area.Type: ApplicationFiled: October 18, 2005Publication date: December 7, 2006Applicant: ASML Netherlands B.V.Inventors: Nicolaas Antonius Allegondus Van Asten, Oana Balan, Luberthus Ouwehand, Machiel Jacobus Viguurs, Alexander Charles Van Well, Lun Cheng, Huibert Blokland, Elke Van Loenhout, Hans Baltus Bakker
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Publication number: 20060170892Abstract: A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table.Type: ApplicationFiled: December 27, 2005Publication date: August 3, 2006Applicant: ASML Netherlands B.V.Inventors: Willem Herman Koenen, Arthur Minnaert, Luberthus Ouwehand, Johannes Mathias Adriens, Wouter Pril
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Publication number: 20060139595Abstract: The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.Type: ApplicationFiled: December 27, 2004Publication date: June 29, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Willem Herman Koenen, Arthur Winfried Minnaert, Luberthus Ouwehand, Johannes Mathias Adriaens