Abstract: An image sensor includes a scintillator comprising a substrate covered with a layer of luminescent material, the layer of luminescent material comprising a first side in contact with the substrate and a second side, the surface of which has asperities, separated by interstices, a detection radiation emerging from the second side of the layer of luminescent material when the luminescent material is illuminated by a probe radiation through the substrate, characterized in that the second side of the layer of luminescent material is covered with a film of a coating material partially absorbing the detection radiation, and moulding itself to the asperities of the surface of the second side of the layer of luminescent material.

Abstract: The present invention relates to an image sensor. It also relates to a method of fabricating such a sensor. The image sensor includes a scintillator (1) comprising a substrate (3) covered with a layer of luminescent material (4), the layer of luminescent material comprising a first side (15) in contact with the substrate and a second side (16), the surface of which has asperities (5), separated by interstices (7), a detection radiation emerging from the second side of the layer of luminescent material when the luminescent material is illuminated by a probe radiation through the substrate, characterized in that the second side of the layer of luminescent material is covered with a film of a coating material (9) partially absorbing the detection radiation, and moulding itself to the asperities of the surface of the second side of the layer of luminescent material.

Abstract: The invention concerns faceplate, more particularly for plasma display, comprising a substrate on which is provided at least one electrode, made of conductive material consisting of a metal alloy based on aluminium and/or zinc having a melting point higher than 700° C.; the electrode is designed to be coated with a dielectric layer. Thus, the harmful effects derived from reactions of the electrode materials with those of the dielectric layer are limited, in particular when said layer is being cured.

Abstract: The present invention relates to a plate, more particularly for plasma display panels, comprising a substrate 10 on which at least one electrode 21, made of a conducting material consisting of an aluminium-based and/or zinc-based metal alloy having a melting point above 700° C., is produced; the electrode is intended to be covered with a dielectric layer.