Patents by Inventor Luc Daemen

Luc Daemen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for growth of lithium-rich antiperovskite electrolyte films and use thereof
    Patent number: 10044061
    Abstract: A process for preparing a lithium-rich antiperovskite electrolyte film involves forming a composite target of precursor metal oxide(s) and metal halide(s), and exposing the target to a pulsed laser beam under conditions suitable for depositing a film of lithium-rich antiperovskite on a surface. In some embodiments the process is used to prepare a film of Li3OCl from a target largely composed of Li2O and LiCl. Exposure of the target to a pulsed laser beam deposits antiperovskite electrolyte Li3OCl on a substrate. In another embodiment, sputtering may be used to prepare films of lithium-rich antiperovskites using the composite target of precursor metal oxide(s) and metal halide(s).
    Type: Grant
    Filed: June 10, 2015
    Date of Patent: August 7, 2018
    Assignee: Los Alamos National Security, LLC
    Inventors: Xujie Lu, John Howard, Luc Daemen, Yusheng Zhao, Quanxi Jia
  • METHODS FOR GROWTH OF LITHIUM-RICH ANTIPEROVSKITE ELECTROLYTE FILMS AND USE THEREOF
    Publication number: 20150364788
    Abstract: A process for preparing a lithium-rich antiperovskite electrolyte film involves forming a composite target of precursor metal oxide(s) and metal halide(s), and exposing the target to a pulsed laser beam under conditions suitable for depositing a film of lithium-rich antiperovskite on a surface. In some embodiments the process is used to prepare a film of Li3OCl from a target largely composed of Li2O and LiCl. Exposure of the target to a pulsed laser beam deposits antiperovskite electrolyte Li3OCl on a substrate. In another embodiment, sputtering may be used to prepare films of lithium-rich antiperovskites using the composite target of precursor metal oxide(s) and metal halide(s).
    Type: Application
    Filed: June 10, 2015
    Publication date: December 17, 2015
    Inventors: Xujie Lu, John Howard, Luc Daemen, Yusheng Zhao, Quanxi Jia