Patents by Inventor Luc Louellet

Luc Louellet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fabrication of MEMS devices with spin-on glass
    Patent number: 6896821
    Abstract: A method of making an etched structure in the fabrication of a MEMS device involves depositing a bulk layer, typically of polysilicon, prone to surface roughness. At least one layer of photo-insensitive spin-on planarizing material, such as silicate-based spin-on glass, is formed on the bulk layer to reduce surface roughness. This is patterned with a photoresist layer. A deep etch is then performed through the photoresist layer into the bulk layer. This technique results in much more precise etch structures.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: May 24, 2005
    Assignee: DALSA Semiconductor Inc.
    Inventor: Luc Louellet