Patents by Inventor Luc SCHERRER

Luc SCHERRER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9422429
    Abstract: What is described is a transparent polyamide-imide based on one or more different imido-dicarboxylic acids (AB) or derivatives thereof, and cycloaliphatic diamines (C) comprising 6 to 24 carbon atoms, wherein the imido-dicarboxylic acids (AB) or derivatives thereof are selected from the group of imido-dicarboxylic acids (AB) having the following structural formulas: wherein: ASL=(CH2)5-11, phenylene, (ylomethyl)phenyl, bis(ylomethyl)benzene, cyclohexanediyl, (ylomethyl)cyclohexyl, bis(ylomethyl)cyclohexane, cyclopentanediyl, (ylomethyl)cyclopentyl, bis(ylomethyl)cyclopentane, R?OH, O-alkyl, O-aryl, Cl, NH-ASL-COOH, Br, O—(CO)-alkyl, O—(CO)-aryl, R1=H, methyl, ethyl, propyl, with the provision that the ring can be substituted once or twice, and, with double substitution of the ring, the two substituents can be selected from the group, but may be different, and also moulding compounds based thereon, a method for production, and uses.
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: August 23, 2016
    Assignee: EMS-PATENT AG
    Inventors: Botho Hoffmann, Luc Scherrer, Heinz Hoff
  • Publication number: 20160222210
    Abstract: What is described is a transparent polyamide-imide based on one or more different imido-dicarboxylic acids (AB) or derivatives thereof, and cycloaliphatic diamines (C) comprising 6 to 24 carbon atoms, wherein the imido-dicarboxylic acids (AB) or derivatives thereof are selected from the group of imido-dicarboxylic acids (AB) having the following structural formulas: wherein: ASL=(CH2)5-11, phenylene, (ylomethyl)phenyl, bis(ylomethyl)benzene, cyclohexanediyl, (ylomethyl)cyclohexyl, bis(ylomethyl)cyclohexane, cyclopentanediyl, (ylomethyl)cyclopentyl, bis(ylomethyl)cyclopentane, R?OH, O-alkyl, O-aryl, Cl, NH-ASL-COOH, Br, O—(CO)-alkyl, O—(CO)-aryl, R1=H, methyl, ethyl, propyl, with the provision that the ring can be substituted once or twice, and, with double substitution of the ring, the two substituents can be selected from the group, but may be different, and also moulding compounds based thereon, a method for production, and uses.
    Type: Application
    Filed: April 11, 2016
    Publication date: August 4, 2016
    Applicant: EMS-PATENT AG
    Inventors: Botho HOFFMANN, Luc SCHERRER, Heinz HOFF
  • Publication number: 20140072745
    Abstract: What is described is a transparent polyamide-imide based on one or more different imido-dicarboxylic acids (AB) or derivatives thereof, and cycloaliphatic diamines (C) comprising 6 to 24 carbon atoms, wherein the imido-dicarboxylic acids (AB) or derivatives thereof are selected from the group of imido-dicarboxylic acids (AB) having the following structural formulas: wherein: ASL=(CH2)5-11, phenylene, (ylomethyl)phenyl, bis(ylomethyl)benzene, cyclohexanediyl, (ylomethyl)cyclohexyl, bis(ylomethyl)cyclohexane, cyclopentanediyl, (ylomethyl)cyclopentyl, bis(ylomethyl)cyclopentane, R?OH, O-alkyl, O-aryl, Cl, NH-ASL-COOH, Br, O—(CO)-alkyl, O—(CO)-aryl, R1=H, methyl, ethyl, propyl, with the provision that the ring can be substituted once or twice, and, with double substitution of the ring, the two substituents can be selected from the group, but may be different, and also moulding compounds based thereon, a method for production, and uses.
    Type: Application
    Filed: May 2, 2013
    Publication date: March 13, 2014
    Applicant: EMS-PATENT AG
    Inventors: Botho HOFFMANN, Luc SCHERRER, Heinz HOFF
  • Publication number: 20120000562
    Abstract: A partial vacuum brake booster line is produced from a polyamide blend molding compound having a polyamide blend component and an impact resistance component. The polyamide blend component of the polyamide blend molding compound comprises the following polyamides: (A) 25 to 65 wt.-% of at least one partially crystalline polyamide having a melt enthalpy of >40 J/g and having an average of at least 8 C atoms per monomer unit, selected from a group which consists of the polyamides PA 11, PA 610, PA 612, PA 1010, PA 106, PA 106/10T, PA 614, and PA 618; (B) 0 to 25 wt.-% of at least one amorphous and/or microcrystalline polyamide, the microcrystalline polyamide having a melt enthalpy in the range from 4 to 40 J/g; and (C) 1 to 55 wt.-% of at least one polyamide having an average of at most 6 C atoms per monomer unit. The impact resistance component is formed from: (D) 5 to 35 wt.-% of a non-polyamide elastomer or of a mixture of non-polyamide elastomers. All specifications in wt.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 5, 2012
    Applicant: EMS-PATENT AG
    Inventors: Botho HOFFMANN, Ralph KETTL, Luc SCHERRER