Patents by Inventor Luca Grella
Luca Grella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11830699Abstract: An e-beam device includes a cold-field emission source to emit electrons and an extractor electrode to be positively biased with respect to the cold-field emission source to extract the electrons from the cold-field emission source. The extractor electrode has a first opening for the electrons. The e-beam device also includes a mirror electrode with a second opening for the electrons. The mirror electrode is configurable to be positively biased with respect to the extractor electrode during a first mode of operation and to be negatively biased with respect to the extractor electrode during a second mode of operation. The extractor electrode is disposed between the cold-field emission source and the mirror electrode. The e-beam device further includes an anode to be positively biased with respect to the extractor electrode and the cold-field emission source. The mirror electrode is disposed between the extractor electrode and the anode.Type: GrantFiled: July 6, 2021Date of Patent: November 28, 2023Assignee: KLA CorporationInventors: Luca Grella, Nikolai Chubun, Stephen Pitts
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Patent number: 11651934Abstract: An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.Type: GrantFiled: September 30, 2021Date of Patent: May 16, 2023Assignee: KLA CorporationInventors: Xinrong Jiang, Sameet Shriyan, Luca Grella, Kevin Cummings, Christopher Sears
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Publication number: 20230109032Abstract: An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.Type: ApplicationFiled: September 30, 2021Publication date: April 6, 2023Inventors: Xinrong Jiang, Sameet Shriyan, Luca Grella, Kevin Cummings, Christopher Sears
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Publication number: 20230010176Abstract: An e-beam device includes a cold-field emission source to emit electrons and an extractor electrode to be positively biased with respect to the cold-field emission source to extract the electrons from the cold-field emission source. The extractor electrode has a first opening for the electrons. The e-beam device also includes a mirror electrode with a second opening for the electrons. The mirror electrode is configurable to be positively biased with respect to the extractor electrode during a first mode of operation and to be negatively biased with respect to the extractor electrode during a second mode of operation. The extractor electrode is disposed between the cold-field emission source and the mirror electrode. The e-beam device further includes an anode to be positively biased with respect to the extractor electrode and the cold-field emission source. The mirror electrode is disposed between the extractor electrode and the anode.Type: ApplicationFiled: July 6, 2021Publication date: January 12, 2023Inventors: Luca Grella, Nikolai Chubun, Stephen Pitts
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Patent number: 11508591Abstract: An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.Type: GrantFiled: February 8, 2021Date of Patent: November 22, 2022Assignee: KLA CorporationInventors: Xinrong Jiang, Christopher Sears, Nikolai Chubun, Luca Grella
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Publication number: 20220254667Abstract: An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.Type: ApplicationFiled: February 8, 2021Publication date: August 11, 2022Inventors: Xinrong Jiang, Christopher Sears, Nikolai Chubun, Luca Grella
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Patent number: 11302510Abstract: Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.Type: GrantFiled: August 10, 2018Date of Patent: April 12, 2022Assignee: KLA-TENCOR CORPORATIONInventors: Christopher Sears, Luca Grella
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Patent number: 11087950Abstract: Systems and methods to focus and align multiple electron beams are disclosed. A camera produces image data of light from electron beams that is projected at a fiber optics array with multiple targets. An image processing module determines an adjustment to a voltage applied to a relay lens, a field lens, or a multi-pole array based on the image data. The adjustment minimizes at least one of a displacement, a defocus, or an aberration of one of the electron beams. Using a control module, the voltage is applied to the relay lens, the field lens, or the multi-pole array.Type: GrantFiled: August 27, 2018Date of Patent: August 10, 2021Assignee: KLA-Tencor CorporationInventors: Christopher Sears, Luca Grella
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Publication number: 20190371566Abstract: Systems and methods to focus and align multiple electron beams are disclosed. A camera produces image data of light from electron beams that is projected at a fiber optics array with multiple targets. An image processing module determines an adjustment to a voltage applied to a relay lens, a field lens, or a multi-pole array based on the image data. The adjustment minimizes at least one of a displacement, a defocus, or an aberration of one of the electron beams. Using a control module, the voltage is applied to the relay lens, the field lens, or the multi-pole array.Type: ApplicationFiled: August 27, 2018Publication date: December 5, 2019Inventors: Christopher Sears, Luca Grella
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Publication number: 20190371564Abstract: Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.Type: ApplicationFiled: August 10, 2018Publication date: December 5, 2019Inventors: Christopher Sears, Luca Grella
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Patent number: 10460903Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.Type: GrantFiled: December 21, 2016Date of Patent: October 29, 2019Assignee: KLA-Tencor CorporationInventors: Arjun Hegde, Luca Grella, Christopher Sears
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Patent number: 9934933Abstract: Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.Type: GrantFiled: May 12, 2017Date of Patent: April 3, 2018Assignee: KLA-Tencor CorporationInventors: Laurence S. Hordon, Nikolai Chubun, Luca Grella, Xinrong Jiang, Daniel Bui, Kevin Cummings, Christopher Sears, Oscar G. Florendo
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Publication number: 20170287675Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.Type: ApplicationFiled: December 21, 2016Publication date: October 5, 2017Inventors: Arjun Hegde, Luca Grella, Christopher Sears
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Patent number: 8089051Abstract: One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.Type: GrantFiled: February 24, 2010Date of Patent: January 3, 2012Assignee: KLA-Tencor CorporationInventors: Luca Grella, Regina Freed, Mark A. McCord
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Publication number: 20110204251Abstract: One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: February 24, 2010Publication date: August 25, 2011Inventors: Luca GRELLA, Regina FREED, Mark A. McCORD
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Patent number: 7958464Abstract: A method for creating an electron beam pattern exposure, where a pattern of shapes is generated, including at least one of lines and vias. To each shape there is assigned a set of exposure pixels and edge placement constraints. An intensity at each exposure pixel is calculated by using a simplex method, and a latent resist image location is calculated by convolving a proximity function with the pixel intensities. A shape critical dimension and a shape edge slope is statistically evaluated by applying linear regression on the locations of the calculated latent image. The electron beam pattern exposures are produced using dosages linearly optimized on a rotated pixel grid to produce the shape critical dimension and the shape edge slope.Type: GrantFiled: August 28, 2008Date of Patent: June 7, 2011Assignee: KLA-Tencor CorporationInventors: Luca Grella, Allen M. Carroll
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Patent number: 7755061Abstract: One embodiment relates to a dynamic pattern generator for reflection electron beam lithography which includes conductive pixel pads, an insulative border surrounding each conductive pixel pad so as to electrically isolate the conductive pixel pads from each other, and conductive elements coupled to the conductive pixel pads for controllably applying voltages to the conductive pixel pads. The conductive pixel pads are advantageously cup shaped with a bottom portion, a sidewall portion, and an open cavity. Another embodiment relates to a pattern generating apparatus which includes a well structure with sidewalls and a cavity configured above each conductive pixel pad. The sidewalls may include alternating layers of conductive and insulative materials. Other embodiments, aspects and feature are also disclosed.Type: GrantFiled: November 7, 2007Date of Patent: July 13, 2010Assignee: KLA-Tencor Technologies CorporationInventors: Luca Grella, Leonid Baranov, Yehiel Gotkis
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Publication number: 20090114837Abstract: One embodiment relates to a dynamic pattern generator for reflection electron beam lithography which includes conductive pixel pads, an insulative border surrounding each conductive pixel pad so as to electrically isolate the conductive pixel pads from each other, and conductive elements coupled to the conductive pixel pads for controllably applying voltages to the conductive pixel pads. The conductive pixel pads are advantageously cup shaped with a bottom portion, a sidewall portion, and an open cavity. Another embodiment relates to a pattern generating apparatus which includes a well structure with sidewalls and a cavity configured above each conductive pixel pad. The sidewalls may include alternating layers of conductive and insulative materials. Other embodiments, aspects and feature are also disclosed.Type: ApplicationFiled: November 7, 2007Publication date: May 7, 2009Inventors: LUCA GRELLA, LEONID BARANOV, YEHIEL GOTKIS
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Patent number: 7361941Abstract: Parameters of a metrology tool may be determined by measuring a dimension of a feature on a calibration standard with the tool and using the measured dimension and a known traceable value of the dimension to determine a value for the parameter. If the dimension of the feature on the standard has a known traceable value, different standards may be used to calibrate different tools.Type: GrantFiled: December 21, 2004Date of Patent: April 22, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Gian F. Lorusso, Christopher F. Bevis, Luca Grella, David L. Adler, Ian Smith
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Patent number: 7276690Abstract: The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.Type: GrantFiled: August 4, 2004Date of Patent: October 2, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Gian Francesco Lorusso, Luca Grella, Douglas K. Masnaghetti, Amir Azordegan