Patents by Inventor Lucas Henricus Johannes Stevens

Lucas Henricus Johannes Stevens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210072649
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis M Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Patent number: 10871715
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: December 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Publication number: 20200183289
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Application
    Filed: November 21, 2019
    Publication date: June 11, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas POIESZ, Bert Dirk SCHOLTEN, Dirk Willem HARBERTS, Lucas Henricus Johannes STEVENS, Laura Maria FERNANDEZ DIAZ, Johannes Adrianus Cornelis Maria PIJNENBURG, Abraham Alexander SOETHOUDT, Wilhelmus Jacobus Johannes WELTERS, Jimmy Matheus Wilhelmus VAN DE WINKEL
  • Publication number: 20200150549
    Abstract: A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.
    Type: Application
    Filed: June 8, 2018
    Publication date: May 14, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Lucas Henricus Johannes STEVENS, Nina Vladimirovna DZIOMKINA, Laura Maria FERNANDEZ DIAZ, Johannes Adrianus Cornelis Maria PIJNENBURG
  • Patent number: 10481510
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: November 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20180259846
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: May 8, 2018
    Publication date: September 13, 2018
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
  • Patent number: 9989844
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: June 5, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 9645502
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: May 9, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Johannes Onvlee, Lucas Henricus Johannes Stevens, Sander Frederik Wuister, Nikolay Nikolaevich Iosad
  • Publication number: 20170017150
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 19, 2017
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
  • Patent number: 9482960
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: November 1, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 9395630
    Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: July 19, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 9304077
    Abstract: Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: April 5, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Lucas Henricus Johannes Stevens, Arno Jan Bleeker
  • Publication number: 20140160455
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: February 14, 2014
    Publication date: June 12, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Ven Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20140071421
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
    Type: Application
    Filed: March 7, 2012
    Publication date: March 13, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Johannes Onvlee, Lucas Henricus Johannes Stevens, Sander Frederik Wuister, Nikolay Nikolaevich Iosad
  • Patent number: 8547551
    Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: October 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Anastasius Jacobus Anicetus Bruinsma, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Abraham Veefkind, Peter Gerhardus Wihelmus Bussink, Egbert Anne Martijn Brouwer
  • Patent number: 8445873
    Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: May 21, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm
  • Publication number: 20130088699
    Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
    Type: Application
    Filed: March 17, 2011
    Publication date: April 11, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20120241610
    Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
    Type: Application
    Filed: May 23, 2012
    Publication date: September 27, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich BANINE, Levinus Pieter BAKKER, Ralph KURT, Johannes Hubertus Josephina MOORS, Lucas Henricus Johannes STEVENS, Peter Cornelis ZALM
  • Patent number: 8217347
    Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: July 10, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm
  • Patent number: 8149379
    Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
    Type: Grant
    Filed: December 1, 2008
    Date of Patent: April 3, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Lucas Henricus Johannes Stevens, Ronald Van Der Ham, Michel Riepen