Patents by Inventor Lucas Johannes Stevens

Lucas Johannes Stevens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method and device manufactured thereby
    Publication number: 20050057734
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, a plurality of optical elements that form part of at least one of the radiation system, the patterning structure, and the projection system; and a cleaning device. The cleaning device includes at least one cleaning beam of radiation, and a gas. The cleaning device is configured to clean an individual optical element or a subset of the plurality of optical elements.
    Type: Application
    Filed: December 19, 2003
    Publication date: March 17, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Lucas Johannes Stevens, Martinus Antonius Leenders, Hans Meiling, Johannes Josephina Moors