Patents by Inventor Lucas S. Chang

Lucas S. Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for generating beveled edges
    Patent number: 5275695
    Abstract: Improved processes for generating a structure having beveled edges are presented. In a preferred embodiment, two photoresist layers are successively deposited on top of the target material, e.g., a metallization film. The intermediate photoresist layer is developed beyond the lithographically delineated boundaries of the top photoresist layer, forming deep recesses. These recesses remain unchanged during the subsequent etching step, resulting in pre-defined edge profiles in the target material.
    Type: Grant
    Filed: December 18, 1992
    Date of Patent: January 4, 1994
    Assignee: International Business Machines Corporation
    Inventors: Lucas S. Chang, Jerome M. Eldridge, Cherngye Hwang, James H. Lee, Tiee-Ghow Wang