Abstract: Systems and methods to control pulse welding are disclosed. An example welding-type system includes: power conversion circuitry configured to convert input power to welding-type power; and control circuitry configured to control the power conversion circuitry to output the welding-type power in a plurality of pulse cycles, each pulse cycle comprising a background phase, a ramp up phase, a peak phase, and a ramp down phase. Controlling the power conversion circuitry involves: during the ramp up phase of the pulse cycles, controlling the power conversion circuitry in a current-controlled mode and switching to controlling the power conversion circuitry in a voltage-controlled mode when a peak transition voltage is reached; and during the ramp down phase of the pulse cycles, controlling the power conversion circuitry in a current-controlled mode and switching to controlling the power conversion circuitry in a voltage-controlled mode when a background transition voltage is reached.

Abstract: A tool for inserting a barbed fitting of a spile assembly into a conduit includes a main body including a grip, a lever pivotally coupled to the main body and including a trigger, and a jaw assembly. The jaw assembly includes a first jaw extending along an actuation axis and a second jaw coupled to the trigger and moveably coupled to the first jaw. The first jaw is translatably coupled to the main body such that an angle between the actuation axis and the main body is substantially constant. The first jaw and the second jaw are configured to receive the conduit therebetween. The first jaw is configured to move in a first longitudinal direction relative to the main body in response to movement of the trigger toward the grip.

Abstract: A tool for inserting a barbed fitting of a spile assembly into a conduit includes a main body including a grip, a lever pivotally coupled to the main body and including a trigger, and a jaw assembly. The jaw assembly includes a first jaw extending along an actuation axis and a second jaw coupled to the trigger and movably coupled to the first jaw. The first jaw is translatably coupled to the main body such that an angle between the actuation axis and the main body is substantially constant. The first jaw and the second jaw are configured to receive the conduit therebetween. The first jaw is configured to move in a first longitudinal direction relative to the main body in response to movement of the trigger toward the grip.

Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

Abstract: The invention relates to a composition for protecting an agricultural crop against external threats, such as weeds, pathogens, abiotic and biotic stresses and/or for improving the quality of the products produced by the crop, which composition comprises one or more poly-phenols and one or more other active ingredients. The other active ingredients may be natural crop protection compounds, metals, acids, all three optionally combined with each other and/or chemical. antimicrobial agents, or may be small particles of organic material, in particular of fibrous organic material, compounds that induce stress tolerance, compounds that stimulate wound repair and growth, or cellulose containing materials.

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.