Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

Abstract: Methods for forming a diamond like carbon layer with desired film density, mechanical strength and optical film properties are provided. In one embodiment, a method of forming a diamond like carbon layer includes generating an electron beam plasma above a surface of a substrate disposed in a processing chamber, and forming a diamond like carbon layer on the surface of the substrate. The diamond like carbon layer is formed by an electron beam plasma process, wherein the diamond like carbon layer serves as a hardmask layer in an etching process in semiconductor applications. The diamond like carbon layer may be formed by bombarding a carbon containing electrode disposed in a processing chamber to generate a secondary electron beam in a gas mixture containing carbon to a surface of a substrate disposed in the processing chamber, and forming a diamond like carbon layer on the surface of the substrate from elements of the gas mixture.

Abstract: Methods for forming a diamond like carbon layer with desired film density, mechanical strength and optical film properties are provided. In one embodiment, a method of forming a diamond like carbon layer includes generating an electron beam plasma above a surface of a substrate disposed in a processing chamber, and forming a diamond like carbon layer on the surface of the substrate. The diamond like carbon layer is formed by an electron beam plasma process, wherein the diamond like carbon layer serves as a hardmask layer in an etching process in semiconductor applications. The diamond like carbon layer may be formed by bombarding a carbon containing electrode disposed in a processing chamber to generate a secondary electron beam in a gas mixture containing carbon to a surface of a substrate disposed in the processing chamber, and forming a diamond like carbon layer on the surface of the substrate from elements of the gas mixture.

Abstract: An electron beam plasma reactor includes a plasma chamber having a side wall, an upper electrode, a workpiece support to hold a workpiece facing the upper electrode with the workpiece on the support having a clear view of the upper electrode, a first RF power source coupled to said upper electrode, a gas supply, a vacuum pump coupled to the chamber to evacuate the chamber, and a controller. The controller is configured to operate the first RF power source to apply an RF power to upper electrode, and to operate the gas distributor and vacuum pump, so as to create a plasma in an upper portion of the chamber that generates an electron beam from the upper electrode toward the workpiece and a lower electron-temperature plasma in a lower portion of the chamber including the workpiece.

Abstract: A method of forming a layer of diamond-like carbon on a workpiece includes supporting the workpiece in a chamber with the workpiece facing an upper electrode, and forming a plurality of successive sublayers to form the layer of layer of diamond-like carbon by alternating between depositing a sublayer of diamond-like carbon on the workpiece in the chamber and treating the sublayer with a plasma of the inert gas or an electron beam from the upper electrode.

Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

Abstract: A hard mask layer is deposited on a feature layer over a substrate. The hard mask layer comprises an organic mask layer. An opening in the organic mask layer is formed using a first gas comprising a halogen element at a first temperature greater than a room temperature to expose a portion of the feature layer. In one embodiment, a gas comprising a halogen element is supplied to a chamber. An organic mask layer on an insulating layer over a substrate is etched using the halogen element at a first temperature to form an opening to expose a portion of the insulating layer.

Abstract: Methods for forming a diamond like carbon layer with desired film density, mechanical strength and optical film properties are provided. In one embodiment, a method of forming a diamond like carbon layer includes generating an electron beam plasma above a surface of a substrate disposed in a processing chamber, and forming a diamond like carbon layer on the surface of the substrate. The diamond like carbon layer is formed by an electron beam plasma process, wherein the diamond like carbon layer serves as a hardmask layer in an etching process in semiconductor applications. The diamond like carbon layer may be formed by bombarding a carbon containing electrode disposed in a processing chamber to generate a secondary electron beam in a gas mixture containing carbon to a surface of a substrate disposed in the processing chamber, and forming a diamond like carbon layer on the surface of the substrate from elements of the gas mixture.

Abstract: A hard mask layer is deposited on a feature layer over a substrate. The hard mask layer comprises an organic mask layer. An opening in the organic mask layer is formed using a first gas comprising a halogen element at a first temperature greater than a room temperature to expose a portion of the feature layer. In one embodiment, a gas comprising a halogen element is supplied to a chamber. An organic mask layer on an insulating layer over a substrate is etched using the halogen element at a first temperature to form an opening to expose a portion of the insulating layer.

Abstract: A workstation electro-optically reads targets by image capture, and includes a housing, a generally planar window, an imaging module, and a generally planar fold mirror between the window and the module. The module has an illuminating light assembly for directing illumination light along an illumination path through the window at a target for return therefrom during reading, and an image sensing assembly for detecting return illumination light through the window along an imaging path over an imaging field of view during reading. The fold mirror folds the illumination and the imaging paths. The fold mirror and the window lie in planes that are substantially parallel to each other to prevent reflections of the illumination light off of the fold mirror and the window from entering the imaging field of view as virtual images that degrade target detection by the image sensing assembly.

Abstract: A hard mask layer is deposited on a feature layer over a substrate. The hard mask layer comprises an organic mask layer. An opening in the organic mask layer is formed using a first gas comprising a halogen element at a first temperature greater than a room temperature to expose a portion of the feature layer. In one embodiment, a gas comprising a halogen element is supplied to a chamber. An organic mask layer on an insulating layer over a substrate is etched using the halogen element at a first temperature to form an opening to expose a portion of the insulating layer.

Abstract: An aiming light assembly generates an aiming light spot with increased brightness and uniformity over a range of working distances in which targets are electro-optically read by image capture. The assembly includes a light emitting diode (LED) for emitting an aiming light beam, a field stop through which the aiming light beam passes, an aiming lens for optically modifying the aiming light beam passing through the field stop to form the aiming light spot over the range of working distances, and a field lens located in the vicinity of the field stop and operative for imaging the LED downstream of the field stop and in the vicinity of a lens aperture of the aiming lens.

Abstract: A method for controlling a workstation includes the following: (1) energizing a first illuminator to illuminate a first subfield of view with a first illumination pulse and subsequently energizing the first illuminator to illuminate the first subfield of view with a second illumination pulse; (2) exposing the array of photosensitive elements in the imaging sensor for a first sensor-exposure time and subsequently exposing the array of photosensitive elements in the imaging sensor for a second sensor-exposure time; and (3) processing an image captured by the imaging sensor to decode a barcode in the image. The first illumination pulse overlaps with the first sensor-exposure time for a first overlapped-pulse-duration, and the second illumination pulse overlaps with the second sensor-exposure time for a second overlapped-pulse-duration. The first overlapped-pulse-duration is different from the second overlapped-pulse-duration.

Abstract: A workstation electro-optically reads targets by image capture, and includes a housing, a generally planar window, an imaging module, and a generally planar fold mirror between the window and the module. The module has an illuminating light assembly for directing illumination light along an illumination path through the window at a target for return therefrom during reading, and an image sensing assembly for detecting return illumination light through the window along an imaging path over an imaging field of view during reading. The fold mirror folds the illumination and the imaging paths. The fold mirror and the window lie in planes that are substantially parallel to each other to prevent reflections of the illumination light off of the fold mirror and the window from entering the imaging field of view as virtual images that degrade target detection by the image sensing assembly.

Abstract: An aiming light assembly generates an aiming light spot with increased brightness and uniformity over a range of working distances in which targets are electro-optically read by image capture. The assembly includes a light emitting diode (LED) for emitting an aiming light beam, a field stop through which the aiming light beam passes, an aiming lens for optically modifying the aiming light beam passing through the field stop to form the aiming light spot over the range of working distances, and a field lens located in the vicinity of the field stop and operative for imaging the LED downstream of the field stop and in the vicinity of a lens aperture of the aiming lens.

Abstract: A method for controlling a workstation includes the following: (1) energizing a first illuminator to illuminate a first subfield of view with a first illumination pulse and subsequently energizing the first illuminator to illuminate the first subfield of view with a second illumination pulse; (2) exposing the array of photosensitive elements in the imaging sensor for a first sensor-exposure time and subsequently exposing the array of photosensitive elements in the imaging sensor for a second sensor-exposure time; and (3) processing an image captured by the imaging sensor to decode a barcode in the image. The first illumination pulse overlaps with the first sensor-exposure time for a first overlapped-pulse-duration, and the second illumination pulse overlaps with the second sensor-exposure time for a second overlapped-pulse-duration. The first overlapped-pulse-duration is different from the second overlapped-pulse-duration.

Abstract: An apparatus operative to decode a barcode on a target object includes a mirror located within the housing at a position generally facing both the curved window and the imaging lens arrangement of the scan engine. The curved window is configured to operate together with the mirror to direct any of the illumination light reflected by the curved window away from the imaging lens arrangement to avoid the detrimental hot spots in the image.

Abstract: A method and apparatus for using in a barcode reader. The apparatus includes an aiming lens assembly including an irregular-shape lens, an aiming light source positioned behind the aiming lens assembly, and an aperture with the desired aiming pattern shape placed in close proximity to the aiming source for generating a visible aiming light pattern towards the target object. The irregular-shape lens includes at least a recess for accommodating the imaging lens when the irregular-shaped lens is assembled into the apparatus with other components.

Abstract: An apparatus operative to decode a barcode on a target object includes a mirror located within the housing at a position generally facing both the curved window and the imaging lens arrangement of the scan engine. The curved window is configured to operate together with the mirror to direct any of the illumination light reflected by the curved window away from the imaging lens arrangement to avoid the detrimental hot spots in the image.

Abstract: A method and apparatus for using in a barcode reader. The apparatus includes an aiming lens assembly including an irregular-shape lens, an aiming light source positioned behind the aiming lens assembly, and an aperture with the desired aiming pattern shape placed in close proximity to the aiming source for generating a visible aiming light pattern towards the target object. The irregular-shape lens includes at least a recess for accommodating the imaging lens when the irregular-shaped lens is assembled into the apparatus with other components.