Patents by Inventor Ludovic Lattard
Ludovic Lattard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20240017301Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: July 27, 2023Publication date: January 18, 2024Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 11738376Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: GrantFiled: April 22, 2021Date of Patent: August 29, 2023Assignee: ASML Netherlands, B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20210237129Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 22, 2021Publication date: August 5, 2021Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10987705Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 6, 2020Date of Patent: April 27, 2021Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20200230665Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 6, 2020Publication date: July 23, 2020Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10632509Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 26, 2018Date of Patent: April 28, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Publication number: 20200096867Abstract: An edge bead removal system for treating a substrata includes an edge bead removal head with a main body and two arms protruding from the main body. The arms are distanced from each other defining a reception space between them for accommodating a substrate to be treated. The protruding arms each have a functional surface facing each other, and wherein the functional surfaces each have at least one fluid outlet. Further, a method of treating a substrate is described.Type: ApplicationFiled: September 25, 2019Publication date: March 26, 2020Inventors: Ludovic LATTARD, Rainer TARGUS
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Publication number: 20190057838Abstract: An e-beam lithography process includes the following steps: implanting into a substrate, or into a dielectric layer deposited on the surface of the substrate, electrons in a first pattern; depositing an e-beam resist on the surface of the substrate or of the sacrificial dielectric layer; and exposing the resist by means of an electron beam in a second pattern, then developing the resist; the first and second patterns being made up of elementary patterns, the elementary patterns of the first pattern at least partially surrounding the elementary patterns of the second pattern.Type: ApplicationFiled: February 20, 2017Publication date: February 21, 2019Inventors: Ludovic LATTARD, Patrick QUEMERE
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METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20180236505Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 26, 2018Publication date: August 23, 2018Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 9981293Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 21, 2016Date of Patent: May 29, 2018Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20170304878Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 21, 2016Publication date: October 26, 2017Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Patent number: 8018070Abstract: Semiconductor device with a first structure comprising a plurality of at least in part parallel linear structures, a second structure comprising a plurality of pad structures, forming at least in part one of the group of linear structure, curved structure, piecewise linear structure and piecewise curved structure which is positioned at an angle to the first structure, and the plurality of pad structures are intersecting at least one of the linear structures in the first structure. An electronic device with at least one semiconductor device, methods for manufacturing a semiconductor device and a mask system are also covered.Type: GrantFiled: April 20, 2007Date of Patent: September 13, 2011Assignee: Qimonda AGInventors: Stefan Blawid, Ludovic Lattard, Roman Knoefler, Manuela Gutsch, David Pritchard, Martin Roessiger
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Publication number: 20080261395Abstract: Semiconductor device with a first structure comprising a plurality of at least in part parallel linear structures, a second structure comprising a plurality of pad structures, forming at least in part one of the group of linear structure, curved structure, piecewise linear structure and piecewise curved structure which is positioned at an angle to the first structure, and the plurality of pad structures are intersecting at least one of the linear structures in the first structure. An electronic device with at least one semiconductor device, methods for manufacturing a semiconductor device and a mask system are also covered.Type: ApplicationFiled: April 20, 2007Publication date: October 23, 2008Inventors: Stefan Blawid, Ludovic Lattard, Roman Knoefler, Manuela Gutsch, David Pritchard, Martin Roessiger
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Publication number: 20080061338Abstract: A method is used for processing a structure of a semiconductor component. The structure has at least one partial structure to be etched, in particular a sublithographic partial structure. The at least one partial structure has at least one structure to be etched with at least one lateral etch stop to which at least one mask is applied in such a way that at least one lateral etch stop is covered by the mask and afterward at least one of the structures to be etched is etched away isotropically as far as at least one etch stop using the mask. The at least one mask and the at least one etch stop are then removed.Type: ApplicationFiled: September 6, 2007Publication date: March 13, 2008Inventors: Ludovic Lattard, Christoph Noelscher, Martin Verhoeven
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Publication number: 20070243707Abstract: A hard mask layer stack for patterning a layer to be patterned includes a carbon layer disposed on top of the layer to be patterned, a first layer of a material selected from the group of SiO2 and SiON disposed on top of the carbon layer and a silicon layer disposed on top of the first layer. A method of patterning a layer to be patterned includes providing the above described hard mask layer stack on the layer to be patterned and patterning the silicon hard mask layer in accordance with a pattern to be formed in the layer that has to be patterned.Type: ApplicationFiled: March 15, 2007Publication date: October 18, 2007Applicant: QIMONDA AGInventors: Dirk Manger, Hocine Boubekeur, Martin Verhoeven, Nicolas Nagel, Thomas Tatry, Dirk Caspary, Matthias Markert, Lothar Bauch, Stefan Blawid, Manuela Gutsch, Ludovic Lattard, Martin Roessiger, Mirko Vogt
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Publication number: 20070218627Abstract: A method of forming a semiconductor device includes patterning a layer stack to form single conductive lines and single landing pads. Patterning of the layer stack includes two lithographic exposures using a set of two different photomasks. The landing pads are arranged at on side of an array region defined by a plurality of conductive lines. A set of photomasks used in the method of forming a semiconductor device includes a first photomask including patterns corresponding to the conductive lines and a second photomask including patterns corresponding to the landing pads. A semiconductor device includes conductive lines and landing pads connected with corresponding ones of said conductive lines wherein the landing pads are arranged in a staggered fashion at one side of an array region defined by a plurality of conductive lines.Type: ApplicationFiled: March 15, 2006Publication date: September 20, 2007Inventors: Ludovic Lattard, Martin Roessiger, Lothar Bauch, Stefan Blawid, Manuela Gutsch