Abstract: An integrated electric circuit includes one or more circuit networks each having a large number of circuit elements. Images of circuit networks are produced on a computer system and checked for correctness by using predefined testing rules. Those images are marked in which at least one fault is determined. The information obtained in this way is output.

Abstract: A method of producing an integrated circuit configuration where trenches are formed surrounding active regions in a main surface of a semiconductor substrate. A photoresist layer is applied to the insulating layer and structured forming a mask using a data processing device, by the following steps: Providing an idealized pattern representing trenches with contours corresponding to contours of the trenches. Producing an idealized mask pattern on the basis of the idealized pattern shifted by an allowance in comparison with the idealized pattern, the idealized mask pattern has surface zones whose distance apart is shorter than a given minimum measurement. The idealized mask pattern is used to produce a further idealized mask pattern in which the surface zones are replaced by minimum surface elements with length measurements which are greater than the given minimum measurement. The trenches are then filled by depositing an insulating layer using the formed mask.

Abstract: An integrated electric circuit includes one or more circuit networks each having a large number of circuit elements. Images of circuit networks are produced on a computer system and checked for correctness by using predefined testing rules. Those images are marked in which at least one fault is determined. The information obtained in this way is output.

Abstract: A method of producing an integrated circuit configuration where trenches are formed surrounding active regions in a main surface of a semiconductor substrate. A photoresist layer is applied to the insulating layer and structured forming a mask using a data processing device, by the following steps: Providing an idealized pattern representing trenches with contours corresponding to contours of the trenches. Producing an idealized mask pattern on the basis of the idealized pattern shifted by an allowance in comparison with the idealized pattern, the idealized mask pattern has surface zones whose distance apart is shorter than a given minimum measurement. The idealized mask pattern is used to produce a further idealized mask pattern in which the surface zones are replaced by minimum surface elements with length measurements which are greater than the given minimum measurement. The trenches are then filled by depositing an insulating layer using the formed mask.

Abstract: A thread-reserve winding is formed on a bobbin tube of a spinning machine in which the thread is drawn off continuously from the spinning machine by means of a pair of draw-off rollers and, to form the thread-reserve winding, is grasped and wound onto the bobbin tube. According to the invention, immediately after the thread has been grasped, the spinning tension is put into effect to wind on the thread-reserve winding and, after the thread-reserve winding has been applied, the thread is wound on under the normal winding-on tension. In this way, the thread is drawn off by the bobbin tube under a thread tension sufficient to ensure a taut winding.