Patents by Inventor Ludwig Muller

Ludwig Muller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230080774
    Abstract: The present disclosure relates to a method of patterning a thin-film photovoltaic layer stack (20), the method comprising the steps of:—providing of a continuous layer stack (20), the layer stack (20) comprising a planar substrate (21), a first electrode layer (22) on the substrate (21) and a photovoltaic layer (24) on the electrode layer (22),—immersing the layer stack (20) into an electrically conductive solution (40),—applying a bias voltage between the electrolyte solution (40) and the first electrode layer (22) and—converting of a first material (51, 53) or a first material composition provided in at least a first portion (50, 52, 54) of the layer stack (20) into a first reaction product (56) by an electrochemical reaction, wherein the first reaction product (56) has an electrical conductivity that is lower than an electrical conductivity of the first material (51, 53) or first material composition, or—removing a first material (51, 53) or a first material composition provided in at least a first portion
    Type: Application
    Filed: February 17, 2021
    Publication date: March 16, 2023
    Inventors: Shuping Lin, Raffael Reineker, Hongqing Shan, Joachim Leopold Ludwig Müller, Bernd Sprecher, Kay Ogassa
  • Patent number: 5838045
    Abstract: Isotropic deposition of a selectively etchable material in an opening in a body of material followed by isotropic deposition of an etch resistant material forms a mask for anisotropic etching of the selectively etchable material at potentially sub-lithographic dimensions to form potentially sub-lithographic features within a trench. This process can be exploited to form a folded trench capacitor in which a trench is formed with one or more upstanding and possibly hollow features therein; effectively multiplying the surface area and or allowing reduced trench depth for a given charge storage capacity or a combination thereof. Further surface treatments such as deposition of hemispherical grain silicon can be used to further enhance the effective area of the trench. Isolation structures of sub-lithographic dimensions can also be formed by depositing appropriate materials within the trenches formed in accordance with the mask.
    Type: Grant
    Filed: March 5, 1997
    Date of Patent: November 17, 1998
    Assignee: International Business Machines Corporation
    Inventors: Karl Paul Ludwig Muller, Wesley C. Natzle
  • Patent number: 5724144
    Abstract: The processing of a semiconductor body front side surface can be monitored in-situ, and thickness data for a body can be obtained ex-situ, by directing an infrared beam at the back side surface of the body. The light is reflected from front and back sides of a body portion to form primary and secondary reflections which are detected. An interference signal representative of interference fringes of the primary and secondary reflections is generated, and thickness data for the body or a body portion is calculated from the interference signal. In-situ monitoring of processes such as mechanical-chemical polishing, chemical vapor deposition, and plasma or reactive ion etching is achieved by providing a light passageway through a semiconductor body support such as a chuck or electrode, e.g., a cathode. In this manner, the process monitoring does not hinder, and is not hindered by, the processing steps and equipment.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: March 3, 1998
    Assignees: International Business Machines Corp., Kabushiki Kaisha Toshiba
    Inventors: Karl Paul Ludwig Muller, Katsuya Okumura, Theodore G. Van Kessel
  • Patent number: 5674409
    Abstract: A nanolithographic method for forming fine features is disclosed. A carrier layer, such as a photoresist, is deposited on a substrate. A relatively large pattern is imposed on the carrier layer by means of conventional photolithographic methods. The carrier layer is then exposed to a maskless etch, such as by ashing in oxygen, such that non-volatile materials within the carrier layer aggregate along the center line of the pattern, forming a residual pattern of significantly reduced width when compared to the original carrier layer pattern.
    Type: Grant
    Filed: March 16, 1995
    Date of Patent: October 7, 1997
    Assignee: International Business Machines Corporation
    Inventor: K. Paul Ludwig Muller
  • Patent number: 5665622
    Abstract: Isotropic deposition of a selectively etchable material in an opening in a body of material followed by isotropic deposition of an etch resistant material forms a mask for anisotropic etching of the selectively etchable material at potentially sub-lithographic dimensions to form potentially sub-lithographic features within a trench. This process can be exploited to form a folded trench capacitor in which a trench is formed with one or more upstanding and possibly hollow features therein; effectively multiplying the surface area and or allowing reduced trench depth for a given charge storage capacity or a combination thereof. Further surface treatments such as deposition of hemispherical grain silicon can be used to further enhance the effective area of the trench. Isolation structures of sub-lithographic dimensions can also be formed by depositing appropriate materials within the trenches formed in accordance with the mask.
    Type: Grant
    Filed: March 15, 1995
    Date of Patent: September 9, 1997
    Assignee: International Business Machines Corporation
    Inventors: Karl Paul Ludwig Muller, Wesley C. Natzle
  • Patent number: 5419159
    Abstract: An article of jewelry having a stone mounted on a support. The stone having two grooves formed in opposite side facets which are engaged by two facing surfaces of the support to secure the stone in the support. In one embodiment, the support includes an array of bars, each bar having a central cavity and two side walls. Each side wall has a surface for engaging a corresponding groove in the stone and an attachment for articulated connection of each bar to the adjacent bars.
    Type: Grant
    Filed: August 6, 1993
    Date of Patent: May 30, 1995
    Inventor: Ludwig Muller
  • Patent number: 5164026
    Abstract: A gold alloy comprises at least gold, iron and nickel, the gold being present in an amount between about 74.4 and 94.5 percent by weight of the alloy, the iron being present in an amount between about 5.0 and 25.0 percent by weight of the alloy, and the nickel being present in an amount between about 0.5 to about 0.6 percent by weight of the alloy. Heat treatment of the alloy causes a visually observable blue coloration.
    Type: Grant
    Filed: July 2, 1991
    Date of Patent: November 17, 1992
    Assignee: Ludwig Muller S.A.
    Inventor: Ludwig Muller
  • Patent number: 5059255
    Abstract: A gold alloy comprises at least gold, iron and nickel, the gold being present in an amount between about 74.4 and 94.5 percent by weight of the alloy, the iron being present in an amount between about 5.0 and 25.0 percent by weight of the alloy, and the nickel being present in an amount between about 0.5 to about 0.6 percent by weight of the alloy. Heat treatment of the alloy causes a visually observable blue coloration.
    Type: Grant
    Filed: April 17, 1990
    Date of Patent: October 22, 1991
    Assignee: Ludwig Muller S.A.
    Inventor: Ludwig Muller
  • Patent number: 4522809
    Abstract: A process is disclosed for producing virus sub-units with lipid envelopes, comprising, in a neutral or basic pH, dissolving a lower halogenated hydrocarbon, at a concentration equivalent to or approximating its limit of solubility, in an aqueous virus suspension, thereafter contacting, with stirring, the preparation so obtained with a nonionic detergent at a minimum concentration effective to induce disruption of virions into heavy sub-units for a length of time sufficient to permit said disruption, and in separating the heavy sub-units so obtained from the reaction medium. The process permits preparation of purified disrupted antigens for use as vaccines, notably influenza vaccines.
    Type: Grant
    Filed: August 1, 1984
    Date of Patent: June 11, 1985
    Assignee: Institut Pasteur
    Inventors: Philippe Adamowicz, Ludwig Muller
  • Patent number: 4461645
    Abstract: A method of and an apparatus for cooling white cement clinker from a rotary kiln wherein the clinker is classified into at least two and preferably more particle-size fractions which are quenched with water with residence times staggered so as to increase as the particle size range increases. The cooling is effected to a temperature of below 1200.degree. C. but without excessively cooling the clinker so that all fractions retain sufficient sensible heat to drive off water picked up during the quenching process and resulting in completely dry clinker.
    Type: Grant
    Filed: May 24, 1982
    Date of Patent: July 24, 1984
    Assignee: BKMI Industrieanlagen GmbH
    Inventors: Gunter Roth, Wolfram Quittkat, Dieter Frank, Ludwig Muller, Wilhelm Grassmann
  • Patent number: 4335214
    Abstract: The invention relates to a process for purifying biological particles, particularly for purifying the surface antigen (HBs) of the hepatitis B virus. A suspension of this HBs antigen is subjected to rate zonal banding in a gradient inside a centrifuge equipped with a continuous-flow core. At the same time as the centrifugation operation is carried out, the suspension of particles to be purified is caused to circulate in a closed circuit in which the centrifuge is inserted. The band containing the purified biological particles is then collected in a way known per se.
    Type: Grant
    Filed: December 5, 1980
    Date of Patent: June 15, 1982
    Assignee: Institut Pasteur
    Inventors: Philippe J. Adamowicz, Alberte Platel nee Bonnet, Ludwig Muller
  • Patent number: 4012883
    Abstract: There is disclosed a device for fixedly attaching a double-T or an I-beam to a sheet piling. Such fixed attachment of the beam is effected by welding an anchor bolt to the rib of the beam and/or bracing bars which in turn are welded to the flanges of the beam. Such welding is effected prior to transporting the beam to the location for attaching it to the sheet piling. Due to the welding of the anchor bolt to the flanges or the rib of the beam, the beam can be driven into the ground with the anchor bolt already attached thereto. Mounting of the anchor bolt and thus of the beam is effected in a conventional manner by a screw connection and a hinge disc.
    Type: Grant
    Filed: July 8, 1975
    Date of Patent: March 22, 1977
    Inventor: Ludwig Muller
  • Patent number: 4003207
    Abstract: There is disclosed a method of and a device for strengthening a sheet piling by means of one or more beams, particularly double T- or I-beams. Such strengthening is effected by driving a beam adjacent to one side of the sheet piling into the ground. The beam is secured to the sheet piling by an elongate strap. This strap has at one end an elongate slot and rigid bars are welded to the strap along the slotted end thereof either on one side or on both sides of the strap, depending upon whether the beam is a T-beam or a double T-beam. The strap so prepared is then slid at its slotted end into the web of the beam after it is driven into the ground and the bars are then welded to the cross bar or bars of the beam. The other end of the strap is suitably fastened to the sheet piling.
    Type: Grant
    Filed: October 28, 1975
    Date of Patent: January 18, 1977
    Inventor: Ludwig Muller