Abstract: Low- or atmospheric pressure RF plasma-enhanced thin film deposition methods are provided for the deposition of hydrophobic fluorinated thin films onto various substrates. The methods include at least two steps. In the first step, RF plasma-mediated deposition is used to deposit a fluorinated film onto a substrate surface. In a second step, plasma-generated active sites on the fluorinated film are quenched by reacting them with stable fluorinated gas-phase molecules in situ, in the absence of plasma, to provide a hydrophobic fluorinated thin film having a very low oxygen content. In some instances the hydrophobic fluorinated thin films have an atomic oxygen concentration of no more than about 3%.

Abstract: Hard-carbon films with unique structures, methods for producing the films, and articles coated by the films are provided. These hard-carbon films are synthesized by the plasma surface treatment of a polymer substrate or a polymer-coated substrate in a plasma containing SFx species, where x is less than 6, and may be produced under room temperature, low pressure environments.

Abstract: Hard-carbon films with unique structures, methods for producing the films, and articles coated by the films are provided. These hard-carbon films are synthesized by the plasma surface treatment of a polymer substrate or a polymer-coated substrate in a plasma containing SFx species, where x is less than 6, and may be produced under room temperature, low pressure environments.

Abstract: Methods for producing plasma-treated, functionalized carbon-containing surfaces are provided. The methods include the steps of subjecting a carbon-containing substrate to a plasma to create surface active sites on the surface of the substrate and reacting the surface active sites with stable spacer molecules in the absence of plasma. Biomolecules may be immobilized on the resulting functionalized surfaces. The methods may be used to treat a variety of carbon-containing substrates, including polymeric surfaces, diamond-like carbon films and carbon nanotubes and nanoparticles.

Abstract: Hard-carbon films with unique structures, methods for producing the films, and articles coated by the films are provided. These hard-carbon films are synthesized by the plasma surface treatment of a polymer substrate or a polymer-coated substrate in a plasma containing SFx species, where x is less than 6, and may be produced under room temperature, low pressure environments.