Patents by Inventor Luis Estevez

Luis Estevez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240033709
    Abstract: In one aspect, an oxygenated hierarchically porous carbon (an “O-HPC”) is provided, the O-HPC comprising: a hierarchically porous carbon (an “UPC”), the HPC comprising a surface, the surface comprising: (A) first order pores having an average diameter of between about 1 ?m and about 10 ?m; and (B) walls separating the first order pores, the walls comprising: (1) second order pores having a peak diameter between about 7 nm and about 130 nm; and (2) third order pores having an average diameter of less than about 4 nm, wherein at least a portion of the HPC surface has been subjected to O2 plasma to oxygenate and induce a negative charge to the surface. In one aspect, the O-HPC further comprises metal nanoparticles dispersed within the first, second, and third order pores. Methods for making and using the metal nanoparticle-impregnated O-HPCs are also provided.
    Type: Application
    Filed: August 14, 2023
    Publication date: February 1, 2024
    Applicants: AIMM, LLC, The University of Dayton
    Inventors: Luis Estevez, Kenya Crosson
  • Patent number: 11878283
    Abstract: In one aspect, an oxygenated hierarchically porous carbon (an “O-HPC”) is provided, the O-HPC comprising: a hierarchically porous carbon (an “HPC”), the HPC comprising a surface, the surface comprising: (A) first order pores having an average diameter of between about 1 ?m and about 10 ?m; and (B) walls separating the first order pores, the walls comprising: (1) second order pores having a peak diameter between about 7 nm and about 130 nm; and (2) third order pores having an average diameter of less than about 4 nm, wherein at least a portion of the HPC surface has been subjected to O2 plasma to oxygenate and induce a negative charge to the surface. In one aspect, the O-HPC further comprises metal nanoparticles dispersed within the first, second, and third order pores. Methods for making and using the metal nanoparticle-impregnated O-HPCs are also provided.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: January 23, 2024
    Assignees: Advanced & Innovative Multifunctional Materials, LLC, The University of Dayton
    Inventors: Luis Estevez, Kenya Crosson
  • Publication number: 20230249153
    Abstract: In one aspect, an oxygenated hierarchically porous carbon (an “O-HPC”) is provided, the O-HPC comprising: a hierarchically porous carbon (an “HPC”), the HPC comprising a surface, the surface comprising: (A) first order pores having an average diameter of between about 1 ?m and about 10 ?m; and (B) walls separating the first order pores, the walls comprising: (1) second order pores having a peak diameter between about 7 nm and about 130 nm; and (2) third order pores having an average diameter of less than about 4 nm, wherein at least a portion of the HPC surface has been subjected to O2 plasma to oxygenate and induce a negative charge to the surface. In one aspect, the O-HPC further comprises metal nanoparticles dispersed within the first, second, and third order pores. Methods for making and using the metal nanoparticle-impregnated O-HPCs are also provided.
    Type: Application
    Filed: October 26, 2021
    Publication date: August 10, 2023
    Applicants: AIMM, LLC, The University of Dayton
    Inventors: Luis Estevez, Kenya Crosson