Patents by Inventor Luis Jesus Matienzo
Luis Jesus Matienzo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6908684Abstract: A structure comprising a metallic surface, a layer of a polymeric material and a water soluble polymeric material located between the metallic surface and the layer of polymeric material, and process of fabricating such are provided. The structure exhibits enhanced adhesion between the metallic surface and the polymeric material.Type: GrantFiled: March 3, 2004Date of Patent: June 21, 2005Assignee: International Business Machines CorporationInventors: Anastasios P. Angelopoulos, Joan Cangelosi, Joseph Alphonse Kotylo, Luis Jesus Matienzo, Norman L. Shaver, Stephen Joseph Fuerniss
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Publication number: 20040166438Abstract: A structure comprising a metallic surface, a layer of a polymeric material and a water soluble polymeric material located between the metallic surface and the layer of polymeric material, and process of fabricating such are provided. The structure exhibits enhanced adhesion between the metallic surface and the polymeric material.Type: ApplicationFiled: March 3, 2004Publication date: August 26, 2004Applicant: International Business Machines CorporationInventors: Anastasios P. Angelopoulos, Stephen Joseph Fuerniss, Joan Cangelosi, Joseph Alphonse Kotylo, Luis Jesus Matienzo, Norman L. Shaver
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Patent number: 6759597Abstract: Wire bonds are made to palladium coated bonded pads on organic dielectric substrates at temperatures below 200° C. A layer of palladium thicker than 14 micro-inches is covered with a thin flash of gold. Palladium coated over copper pads is protected from copper diffusion by a thin nickel layer positioned between the two. Subsequent baking for 1 hour at 185° C. drives off hydrogen molecules provided the gold is less than 200 Å thick. A bonding wire, preferably of gold is then successfully bonded to the pad using conventional bonding equipment at temperatures below 200° C.Type: GrantFiled: February 2, 1998Date of Patent: July 6, 2004Assignee: International Business Machines CorporationInventors: Lawrence Richard Cutting, John Gerard Gaudiello, Luis Jesus Matienzo, Nikhil Mohan Murdeshwar
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Patent number: 6730409Abstract: A structure comprising a metallic surface, a layer of a polymeric material and a water soluble polymeric material located between the metallic surface and the layer of polymeric material, and process of fabricating such are provided. The structure exhibits enhanced adhesion between the metallic surface and the polymeric material.Type: GrantFiled: May 27, 1999Date of Patent: May 4, 2004Assignee: International Business Machines CorporationInventors: Anastasios P. Angelopoulos, Stephen Joseph Fuerniss, Joseph Alphonse Kotylo, Luis Jesus Matienzo, Norman L. Shaver
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Patent number: 6613184Abstract: The electrical properties of the bond formed between a metal substrate and an electrically conductive adhesive is improved, especially in high humidity conditions, by applying to the metal substrate an organic coupling agent prior to application of the electrically-conductive adhesive thereto.Type: GrantFiled: May 12, 1997Date of Patent: September 2, 2003Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Paul Eugene Logan, Luis Jesus Matienzo
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Patent number: 6519845Abstract: Wire bonds are made to palladium coated bonded lads on organic dielectric substrates at temperatures below 200° C. A layer of palladium thicker than 14 micro-inches is covered with a thin flash of gold. Palladium coated over copper pads is protected from copper diffusion by a thin nickel layer positioned between the two. Subsequent baking for 1 hour at 185° C. drives off hydrogen molecules provided the gold is less than 200 Å thick. A bonding wire, preferably of gold is then successfully bonded to the pad using conventional bonding equipment at temperatures below 200° C.Type: GrantFiled: January 11, 2000Date of Patent: February 18, 2003Assignee: International Business Machines CorporationInventors: Lawrence Richard Cutting, John Gerard Gaudiello, Luis Jesus Matienzo, Nikhil Mohan Murdeshwar
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Patent number: 6337004Abstract: The adhesion of chromium-copper layer to polyimide has been greatly improved by a method which provides controlled reduction, rather than total elimination, of water content in the polyimide. The electronic packaging device which incorporates the flexible circuit prepared by the method exhibits greatly improved reliability. It is believed that the invention can be used to improve the adhesion between other organic materials having moisture affinity and materials comprising in-organics or between two organic materials.Type: GrantFiled: April 28, 1995Date of Patent: January 8, 2002Assignee: International Business Machines CorporationInventors: Kim Joseph Blackwell, Pei Cheh Chen, Frank Daniel Egitto, Allan Robert Knoll, George Joseph Matarese, Luis Jesus Matienzo
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Patent number: 6265462Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: January 28, 2000Date of Patent: July 24, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 6252012Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: August 30, 1999Date of Patent: June 26, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 6235411Abstract: A metallic layer is coated onto a polyimide substrate by sputtering a layer of chromium followed by a layer of copper whereby the rate of deposition of the chromium is about 4 angstroms/second or less.Type: GrantFiled: June 28, 1994Date of Patent: May 22, 2001Assignee: International Business Machines CorporationInventors: Kim Joseph Blackwell, Pei Cheh Chen, Allan Robert Knoll, Luis Jesus Matienzo, Richard Dean Weale
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Patent number: 6232363Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: April 25, 2000Date of Patent: May 15, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 6204305Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: August 30, 1999Date of Patent: March 20, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 5997997Abstract: The present invention provides a novel method of reducing the amount of seed deposited on polymeric dielectric surfaces. The method comprises the following steps: providing a work-piece coated with a polymeric dielectric layer; baking the work-piece to modify the surface of the polymeric dielectric layer; then applying the seed to polymeric dielectric layer and electrolessly plating metal to the seed layer. The invention also relates to a circuit board produced by the method of the present invention.Type: GrantFiled: June 13, 1997Date of Patent: December 7, 1999Assignee: International Business Machines Corp.Inventors: Anastasios Peter Angelopoulos, Gerald Walter Jones, Luis Jesus Matienzo, Thomas Richard Miller, Voya Rista Markovich
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Patent number: 5958996Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: February 28, 1997Date of Patent: September 28, 1999Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 5935652Abstract: The present invention provides a novel method of reducing the amount of seed deposited on polymeric dielectric surfaces. The method comprises the following steps: providing a work-piece coated with a polymeric dielectric layer; baking the work-piece to modify the surface of the polymeric dielectric layer; then applying the seed to polymeric dielectric layer and electrolessly plating metal to the seed layer. The invention also relates to a circuit board produced by the method of the present invention.Type: GrantFiled: March 23, 1998Date of Patent: August 10, 1999Assignee: International Business Machines Corp.Inventors: Anastasios Peter Angelopoulos, Gerald Walter Jones, Luis Jesus Matienzo, Thomas Richard Miller, Voya Rista Markovich
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Patent number: 5693928Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: June 27, 1996Date of Patent: December 2, 1997Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.