Patents by Inventor Luis MELO DE CARVALHO

Luis MELO DE CARVALHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10524756
    Abstract: One example method to reduce image artifacts, which may include obtaining measured projection data acquired using an imaging system. The measured projection data is associated with a target object and an artifact source within a radiation field of the imaging system. The method may also include generating virtual projection data associated with the artifact source by forward projecting a model representing one or more physical properties of the artifact source. The method may further include generating corrected projection data based on the measured projection data and the virtual projection data; and reconstructing the corrected projection data into reconstructed volume image data to reduce image artifacts caused by the artifact source.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: January 7, 2020
    Assignee: VARIAN MEDICAL SYSTEMS INTERNATIONAL
    Inventors: Pascal Paysan, Luis Melo De Carvalho, Dieter Seghers, Marcus Brehm
  • Publication number: 20170055931
    Abstract: One example method to reduce image artifacts, which may include obtaining measured projection data acquired using an imaging system. The measured projection data is associated with a target object and an artifact source within a radiation field of the imaging system. The method may also include generating virtual projection data associated with the artifact source by forward projecting a model representing one or more physical properties of the artifact source. The method may further include generating corrected projection data based on the measured projection data and the virtual projection data; and reconstructing the corrected projection data into reconstructed volume image data to reduce image artifacts caused by the artifact source.
    Type: Application
    Filed: August 27, 2015
    Publication date: March 2, 2017
    Inventors: Pascal PAYSAN, Luis MELO DE CARVALHO, Dieter SEGHERS, Marcus BREHM