Patents by Inventor Luis Miguel Gaspar Venancio

Luis Miguel Gaspar Venancio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wave front reconstruction for dielectric coatings at arbitrary wavelength
    Patent number: 11592392
    Abstract: A method of determining a phase shift caused by reflection at, or transmission through, a dielectric coating as a function of wavenumber includes obtaining a nominal phase shift for the dielectric coating as a function of wavenumber, determining a first wavenumber and a second wavenumber for performing measurements of phase shift at these wavenumbers based on the nominal phase shift, determining a wavenumber shift based on a first measurement of phase shift at the first wavenumber, a second measurement of phase shift at the second wavenumber, and the nominal phase shift as a function of wavenumber, and determining the phase shift as a function of wavenumber based on the wavenumber shift and the nominal phase. Further described is a method of determining a layer design for a dielectric coating, wherein the dielectric coating comprises a plurality of stacked layers.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: February 28, 2023
    Assignee: European Space Agency
    Inventor: Luis Miguel Gaspar Venancio
  • WAVE FRONT RECONSTRUCTION FOR DIELECTRIC COATINGS AT ARBITRARY WAVELENGTH
    Publication number: 20200348228
    Abstract: A method of determining a phase shift caused by reflection at, or transmission through, a dielectric coating as a function of wavenumber includes obtaining a nominal phase shift for the dielectric coating as a function of wavenumber, determining a first wavenumber and a second wavenumber for performing measurements of phase shift at these wavenumbers based on the nominal phase shift, determining a wavenumber shift based on a first measurement of phase shift at the first wavenumber, a second measurement of phase shift at the second wavenumber, and the nominal phase shift as a function of wavenumber, and determining the phase shift as a function of wavenumber based on the wavenumber shift and the nominal phase. Further described is a method of determining a layer design for a dielectric coating, wherein the dielectric coating comprises a plurality of stacked layers.
    Type: Application
    Filed: December 22, 2017
    Publication date: November 5, 2020
    Inventor: Luis Miguel Gaspar Venancio