Patents by Inventor Luisa D. Bozano
Luisa D. Bozano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11500285Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.Type: GrantFiled: October 11, 2018Date of Patent: November 15, 2022Assignee: International Business Machines CorporationInventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
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Publication number: 20200278607Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.Type: ApplicationFiled: October 11, 2018Publication date: September 3, 2020Applicants: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
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Patent number: 10345700Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.Type: GrantFiled: September 8, 2014Date of Patent: July 9, 2019Assignees: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
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Patent number: 10236184Abstract: Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.Type: GrantFiled: May 29, 2018Date of Patent: March 19, 2019Assignee: International Business Machines CorporationInventors: Amy N. Bowers, Luisa D. Bozano, Andrea Fasoli, Krystelle Lionti, Elizabeth M. Lofano, Robert D. Miller, Linda K. Sundberg
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Publication number: 20180330955Abstract: Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.Type: ApplicationFiled: May 29, 2018Publication date: November 15, 2018Inventors: Amy N. Bowers, Luisa D. Bozano, Andrea Fasoli, Krystelle Lionti, Elizabeth M. Lofano, Robert D. Miller, Linda K. Sundberg
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Patent number: 10020199Abstract: Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.Type: GrantFiled: May 15, 2017Date of Patent: July 10, 2018Assignee: International Business Machines CorporationInventors: Amy N. Bowers, Luisa D. Bozano, Andrea Fasoli, Krystelle Lionti, Elizabeth M. Lofano, Robert D. Miller, Linda K. Sundberg
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Patent number: 9389516Abstract: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites.Type: GrantFiled: March 3, 2015Date of Patent: July 12, 2016Assignee: International Business Machines CorporationInventors: Luisa D. Bozano, Dario L. Goldfarb, Linda K. Sundberg, Hoa D. Truong, Hsinyu Tsai, Gregory M. Walraff
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Publication number: 20160070169Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.Type: ApplicationFiled: September 8, 2014Publication date: March 10, 2016Applicants: SHIN-ETSU CHEMICAL CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
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Publication number: 20150309415Abstract: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites.Type: ApplicationFiled: March 3, 2015Publication date: October 29, 2015Applicant: International Business Machines CorporationInventors: LUISA D. BOZANO, DARIO L. GOLDFARB, LINDA K. SUNDBERG, HOA D. TRUONG, HSINYU TSAI, GREGORY M. WALRAFF
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Patent number: 9057960Abstract: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites.Type: GrantFiled: March 14, 2013Date of Patent: June 16, 2015Assignee: International Business Machines CorporationInventors: Luisa D. Bozano, Dario L. Goldfarb, Linda K. Sundberg, Hoa D. Truong, Hsinyu Tsai, Gregory M. Wallraff
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Patent number: 8900802Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.Type: GrantFiled: February 23, 2013Date of Patent: December 2, 2014Assignees: International Business Machines Corporation, JSR CorporationInventors: Robert D. Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda K. Sundberg, Sally A. Swanson, Hoa D. Truong, Gregory M. Wallraff
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Publication number: 20140242526Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.Type: ApplicationFiled: February 23, 2013Publication date: August 28, 2014Applicants: JSR CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda K. Sundberg, Sally A. Swanson, Hoa D. Truong, Gregory M. Wallraff
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Patent number: 8530136Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.Type: GrantFiled: December 17, 2010Date of Patent: September 10, 2013Assignee: International Business Machines CorporationInventors: Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, William D. Hinsberg, Ratnam Sooriyakumaran, Linda K. Sundberg
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Publication number: 20120156611Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.Type: ApplicationFiled: December 17, 2010Publication date: June 21, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, William D. Hinsberg, Ratnam Sooriyakumaran, Linda K. Sundberg
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Patent number: 7993812Abstract: Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.Type: GrantFiled: July 23, 2009Date of Patent: August 9, 2011Assignee: International Business Machines CorporationInventors: Luisa D. Bozano, Hiroshi Ito, Atsuko Ito, legal representative, Linda K. Sundberg
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Publication number: 20110020756Abstract: Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.Type: ApplicationFiled: July 23, 2009Publication date: January 27, 2011Applicant: International Business Machines CorporationInventors: Luisa D. Bozano, Hiroshi Ito, Atsuko Ito, Linda K. Sundberg