Patents by Inventor Lukáš Malý

Lukáš Malý has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12444022
    Abstract: Methods and apparatus apply focus stacking to sample preparation, improving accuracy of analytic tasks, facilitating automation, and improving throughput. Focus stacking is applied to a set of sample images having different focus depths, to produce a composite image in which features at different depths are in focus and, optionally, a depth map. A sample location is selected from the composite image and a localized material removal, measurement, or imaging operation is performed based on the sample location. A depth value from the depth map is used to set a working depth of a tool for performing the localized operation. Applications include lamella preparation for cryogenic TEM analysis of biological samples. Other applications, techniques, and variations are disclosed.
    Type: Grant
    Filed: June 30, 2023
    Date of Patent: October 14, 2025
    Assignee: FEI Company
    Inventors: Matej Dolník, Radim Kříž, Lukáš Malý
  • Publication number: 20250005714
    Abstract: Methods and apparatus apply focus stacking to sample preparation, improving accuracy of analytic tasks, facilitating automation, and improving throughput. Focus stacking is applied to a set of sample images having different focus depths, to produce a composite image in which features at different depths are in focus and, optionally, a depth map. A sample location is selected from the composite image and a localized material removal, measurement, or imaging operation is performed based on the sample location. A depth value from the depth map is used to set a working depth of a tool for performing the localized operation. Applications include lamella preparation for cryogenic TEM analysis of biological samples. Other applications, techniques, and variations are disclosed.
    Type: Application
    Filed: June 30, 2023
    Publication date: January 2, 2025
    Applicant: FEI Company
    Inventors: Matej Dolník, Radim Kríž, Lukáš Malý
  • Publication number: 20230335371
    Abstract: The present invention relates to a method and a system for compensating interference in a charged particle beam microscopy system. A step of capturing data obtained from irradiation of a sample for a sampling duration can be implemented. In the system a respective data storage is provided for capturing and/or storing this data. Further steps of dividing at least representative parts of the sampling duration into time-windows and constructing, for each of the time-windows, an intermediate image, can be implemented. Detecting shift between the intermediate images and determining a compensation function for the shift between the intermediate images is realized as well. In a system the latter steps are automated by a respective processing component. The shift between intermediate images can be a two-dimensional shift and the compensation function represents a shift of the intermediate images in the two dimensions over time.
    Type: Application
    Filed: April 13, 2023
    Publication date: October 19, 2023
    Inventors: Lukáš Malý, Jaroslav Pavliš, Jan Klusácek, Lukáš Brínek