Patents by Inventor Lukás HÜBNER

Lukás HÜBNER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220102121
    Abstract: Methods and systems for generating high resolution reconstructions of 3D samples imaged using slice and view processes where the electron interaction depth of the imaging beam is greater than slice thicknesses. Data obtained via such slice and view processes is enhanced with a depth blur reducing algorithm, that is configured to reduce depth blur caused by portions of the first data and second data that are resultant from electron interactions outside the first layer and second layer, respectively, to create enhanced first data and second enhanced data. A high-resolution 3D reconstruction of the sample is then generated using the enhanced first data and the enhanced second data. In some embodiments, the depth blur reducing algorithm may be selected from a set of such algorithms that have been individually configured for certain microscope conditions, sample conditions, or a combination thereof.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Milos HOVORKA, Maurice PEEMEN, Lukás HÜBNER
  • Publication number: 20220093359
    Abstract: Apparatuses and methods for aligning lamella to charged particle beams based on a volume reconstruction are disclosed herein. An example method at least includes forming a reconstructed volume of a portion of a sample, the sample including a plurality of structures, and the reconstructed volume including a portion of the plurality of structures, performing, over a range of angles, a mathematical transform on each plane of a plurality of planes of the reconstructed volume, and based on the mathematical transform on each plane of the plurality of planes, determining a target orientation of the sample within the range of angles, wherein the target orientation aligns the plurality of structures parallel to an optical axis of a charged particle beam.
    Type: Application
    Filed: September 23, 2020
    Publication date: March 24, 2022
    Applicant: FEI Company
    Inventors: Tomás ONDERLICKA, Jaroslav STÁREK, Lukás HÜBNER