Patents by Inventor Lukas Doessel

Lukas Doessel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • GRAPHENE NANORIBBON PRECURSORS AND MONOMERS SUITABLE FOR PREPARATION THEREOF
    Publication number: 20160333141
    Abstract: Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
    Type: Application
    Filed: July 26, 2016
    Publication date: November 17, 2016
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Matthias Georg SCHWAB, Klaus MUELLEN, Xinliang FENG, Lukas DOESSEL
  • Graphene nanoribbon precursors and monomers suitable for preparation thereof
    Patent number: 9434619
    Abstract: Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
    Type: Grant
    Filed: October 24, 2012
    Date of Patent: September 6, 2016
    Assignees: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenshaften e.V.
    Inventors: Matthias Georg Schwab, Klaus Muellen, Xinliang Feng, Lukas Doessel
  • GRAPHENE NANORIBBON PRECURSORS AND MONOMERS SUITABLE FOR PREPARATION THEREOF
    Publication number: 20140301936
    Abstract: Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
    Type: Application
    Filed: October 24, 2012
    Publication date: October 9, 2014
    Applicants: BASF SE, Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
    Inventors: Matthias Georg Schwab, Klaus Muellen, Xinliang Feng, Lukas Doessel