Patents by Inventor Lukas Kral

Lukas Kral has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for beam position visualization
    Patent number: 10998166
    Abstract: A charged-particle beam (CPB) is aligned to a primary axis of a CPB microscope by determining a first beam deflection drive to a beam deflector for directing the CPB passing a reference location displaced from the primary axis. The beam deflector is provided with a second beam deflection drive during the working mode of the CPB microscope to propagate the beam along the primary axis. The second beam deflection drive is determined based on the first beam deflection drive.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: May 4, 2021
    Assignee: FEI Company
    Inventors: Branislav Straka, Radek Smolka, Lukas Kral, Jan Skalicky
  • SYSTEM AND METHOD FOR BEAM POSITION VISUALIZATION
    Publication number: 20210035775
    Abstract: A charged-particle beam (CPB) is aligned to a primary axis of a CPB microscope by determining a first beam deflection drive to a beam deflector for directing the CPB passing a reference location displaced from the primary axis. The beam deflector is provided with a second beam deflection drive during the working mode of the CPB microscope to propagate the beam along the primary axis. The second beam deflection drive is determined based on the first beam deflection drive.
    Type: Application
    Filed: December 12, 2019
    Publication date: February 4, 2021
    Applicant: FEI Company
    Inventors: Branislav Straka, Radek Smolka, Lukas Kral, Jan Skalicky
  • Focused ion beam impurity identification
    Patent number: 10763079
    Abstract: A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: September 1, 2020
    Assignee: FEI Company
    Inventors: Jeremy Graham, Lukas Kral
  • FOCUSED ION BEAM IMPURITY IDENTIFICATION
    Publication number: 20200266030
    Abstract: A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.
    Type: Application
    Filed: February 19, 2019
    Publication date: August 20, 2020
    Applicant: FEI Company
    Inventors: Jeremy Graham, Lukas Kral