Patents by Inventor Lukasz SOSNIAK

Lukasz SOSNIAK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Patent number: 10345717
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: July 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20180239258
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Application
    Filed: April 20, 2018
    Publication date: August 23, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Günes NAKIBOGLU, Suzanne Johanna Antonetta Geertruda COSIJNS, Anne Willemijn Bertine QUIST, Lukasz SOSNIAK, Frank Johannes Jacobus VAN BOXTEL, Engelbertus Antonius Fransiscus VAN DER PASCH
  • Lithographic apparatus and method
    Patent number: 9977348
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: May 22, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20170219930
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Application
    Filed: June 25, 2015
    Publication date: August 3, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Günes NAKIBOGLU, Suzanne Johanna Antonetta Geertruda GOSIJNS, Anne Willemijn Bertine QUIST, Lukasz SOSNIAK, Frank Johannes Jacobus VAN BOXTEL, Engelbertus Antonius Fransiscu VAN DER PASCH