Patents by Inventor Lung Kei Amos SHEK

Lung Kei Amos SHEK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma treatment device and structure of reaction vessel for plasma treatment
    Patent number: 11227748
    Abstract: The present invention improves the in-plane uniformity of films formed via a plasma treatment.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: January 18, 2022
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek
  • Plasma treatment device and structure of reaction vessel for plasma treatment
    Patent number: 11225718
    Abstract: The present invention improves the in-plane uniformity of film formation via a plasma treatment.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: January 18, 2022
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek
  • Substrate tray for use in thin-film formation device
    Patent number: 11174554
    Abstract: Provided is a substrate tray which is to be used in a thin-film formation device and makes it easy to improve film quality and film thickness uniformity on a substrate by improving substrate heating efficiency and substrate heating uniformity.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: November 16, 2021
    Assignees: CORE TECHNOLOGY, INC., ASKAGI CORPORATION
    Inventors: Toshiaki Yoshimura, Hiroyuki Minowa, Lung Kei Amos Shek
  • SUBSTRATE TRAY FOR USE IN THIN-FILM FORMATION DEVICE
    Publication number: 20210180186
    Abstract: Provided is a substrate tray which is to be used in a thin-film formation device and makes it easy to improve film quality and film thickness uniformity on a substrate by improving substrate heating efficiency and substrate heating uniformity.
    Type: Application
    Filed: March 3, 2016
    Publication date: June 17, 2021
    Inventors: Toshiaki YOSHIMURA, Hiroyuki MINOWA, Lung Kei Amos SHEK
  • PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT
    Publication number: 20190048468
    Abstract: The present invention improves the in-plane uniformity of film formation via a plasma treatment.
    Type: Application
    Filed: March 3, 2016
    Publication date: February 14, 2019
    Inventors: Toshiaki YOSHIMURA, Hiroyuki MINOWA, Lung Kei Amos SHEK
  • PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT
    Publication number: 20190019656
    Abstract: The present invention improves the in-plane uniformity of films formed via a plasma treatment.
    Type: Application
    Filed: March 3, 2016
    Publication date: January 17, 2019
    Inventors: Toshiaki YOSHIMURA, Hiroyuki MINOWA, Lung Kei Amos SHEK