Patents by Inventor Lung-Lin Hsu

Lung-Lin Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145470
    Abstract: A method for processing an integrated circuit includes forming first and second gate all around transistors. The method forms a dipole oxide in the first gate all around transistor without forming the dipole oxide in the second gate all around transistor. This is accomplished by entirely removing an interfacial dielectric layer and a dipole-inducing layer from semiconductor nanosheets of the second gate all around transistor before redepositing the interfacial dielectric layer on the semiconductor nanosheets of the second gate all around transistor.
    Type: Application
    Filed: January 5, 2024
    Publication date: May 2, 2024
    Inventors: Lung-Kun CHU, Mao-Lin HUANG, Chung-Wei HSU, Jia-Ni YU, Kuo-Cheng CHIANG, Kuan-Lun CHENG, Chih-Hao WANG
  • Patent number: 11961840
    Abstract: A semiconductor device structure is provided. The device includes one or more first semiconductor layers, each first semiconductor layer of the one or more first semiconductor layers is surrounded by a first intermixed layer, wherein the first intermixed layer comprises a first material and a second material.
    Type: Grant
    Filed: August 9, 2022
    Date of Patent: April 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Mao-Lin Huang, Lung-Kun Chu, Chung-Wei Hsu, Jia-Ni Yu, Kuo-Cheng Chiang, Kuan-Lun Cheng, Chih-Hao Wang
  • Publication number: 20240120402
    Abstract: A semiconductor device structure, along with methods of forming such, are described. The semiconductor device structure includes a first dielectric feature extending along a first direction, the first dielectric feature comprising a first dielectric layer having a first sidewall and a second sidewall opposing the first sidewall, a first semiconductor layer disposed adjacent the first sidewall, the first semiconductor layer extending along a second direction perpendicular to the first direction, a second dielectric feature extending along the first direction, the second dielectric feature disposed adjacent the first semiconductor layer, and a first gate electrode layer surrounding at least three surfaces of the first semiconductor layer, and a portion of the first gate electrode layer is exposed to a first air gap.
    Type: Application
    Filed: November 19, 2023
    Publication date: April 11, 2024
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jia-Ni YU, Kuo-Cheng CHIANG, Mao-Lin HUANG, Lung-Kun CHU, Chung-Wei HSU, Chun-Fu LU, Chih-Hao WANG, Kuan-Lun CHENG
  • Publication number: 20240113195
    Abstract: Semiconductor structures and methods for forming the same are provided. The semiconductor structure includes a plurality of first nanostructures formed over a substrate, and a dielectric wall adjacent to the first nanostructures. The semiconductor structure also includes a first liner layer between the first nanostructures and the dielectric wall, and the first liner layer is in direct contact with the dielectric wall. The semiconductor structure also includes a gate structure surrounding the first nanostructures, and the first liner layer is in direct contact with a portion of the gate structure.
    Type: Application
    Filed: February 22, 2023
    Publication date: April 4, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jia-Ni YU, Lung-Kun CHU, Chun-Fu LU, Chung-Wei HSU, Mao-Lin HUANG, Kuo-Cheng CHIANG, Chih-Hao WANG
  • Patent number: 11948987
    Abstract: A semiconductor device according to the present disclosure includes a source feature and a drain feature, a plurality of semiconductor nanostructures extending between the source feature and the drain feature, a gate structure wrapping around each of the plurality of semiconductor nanostructures, a bottom dielectric layer over the gate structure and the drain feature, a backside power rail disposed over the bottom dielectric layer, and a backside source contact disposed between the source feature and the backside power rail. The backside source contact extends through the bottom dielectric layer.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: April 2, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Lung-Kun Chu, Mao-Lin Huang, Chung-Wei Hsu, Jia-Ni Yu, Kuo-Cheng Chiang, Kuan-Lun Cheng, Chih-Hao Wang
  • Publication number: 20240096880
    Abstract: In some embodiments, the present disclosure relates to an integrated chip. The integrated chip includes a first channel structure configured to transport charge carriers within a first transistor device and a first gate electrode layer wrapping around the first channel structure. A second channel structure is configured to transport charge carriers within a second transistor device. A second gate electrode layer wraps around the second channel structure. The second gate electrode layer continuously extends from around the second channel structure to cover the first gate electrode layer. A third channel structure is configured to transport charge carriers within a third transistor device. A third gate electrode layer wraps around the third channel structure. The third gate electrode layer continuously extends from around the third channel structure to cover the second gate electrode layer.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 21, 2024
    Inventors: Mao-Lin Huang, Chih-Hao Wang, Kuo-Cheng Chiang, Jia-Ni Yu, Lung-Kun Chu, Chung-Wei Hsu
  • Patent number: 8114499
    Abstract: The subject invention provides an optical film comprising a substrate and a resin coating having a convex-concave structure on at least one surface of the substrate, wherein said resin coating comprises a plurality of organic particles and a binder, the organic particles being formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, and said multi-functional acrylate monomer is in an amount from 30 wt % to 70 wt % based on the total weight of the monomers, and wherein the organic particles have a single mean particle size, the particle size distribution of the organic particles ranges within about ±30% of the mean particle size, and the organic particles are in an amount from about 110 to about 360 parts by weight per 100 parts by weight of the solids content of the binder.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: February 14, 2012
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Chun-Ting Wang
  • Patent number: 8110278
    Abstract: The subject invention relates to a scratch-resistant optical film, which comprises: (a) a transparent substrate having a first surface and a second surface; (b) a diffusion layer on the first surface of the substrate, which has a convex-concave structure and is comprised of a first hard coat layer comprising organic particles; (c) a scratch-resistant layer on the second surface of the substrate, which is comprised of a second hard coat layer; wherein the organic particles in the first hard coat layer are formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, said multi-functional acrylate monomer being in an amount from 30 to 70 wt % based on the total weight of the monomer used, and wherein the organic particles have a single mean particle size and have a particle size distribution in the range within about ±5% of the mean particle size.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: February 7, 2012
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Shu-Hong Liu, Chun-Hung Chou
  • Patent number: 8053486
    Abstract: The invention provides a coating composition comprising a thermal plastic resin selected from the group consisting of a polycycloolefin resin, polyester resin, polyacrylate resin, and a mixture thereof; and a radiation curable resin comprising a radiation polymer containing at least one mono- or multi-functional acrylic acid based monomer as a polymerization unit, an oligomer containing an ethylenically unsaturated functional group, and a photoinitiator, wherein the radiation curable resin is used in an amount of 220-1000% by weight on the basis of the weight of the thermal plastic resin. The invention improves the hardness of the coating composition, prevent the coated substrate from being scratched or impaired, and impart the substrate with high transparency without causing warping problem.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: November 8, 2011
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Sue-Hong Liu
  • Patent number: 7972689
    Abstract: An optical thin sheet is provided, which comprises a substrate with a light diffusion layer on at least one side of the substrate. The optical thin sheet has an optical property with respect to a haze of no less than 98% and is particularly suitable for use in flat displays.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: July 5, 2011
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Chia-Yi Lu, Yi-Chung Shih, Ming-Tso Chen, Yen-Fu Huang
  • Patent number: 7867602
    Abstract: The invention pertains to an optical film comprising a reflective substrate, characterized in that at least one of the surfaces of the substrate has a scratch-resistant layer which possesses anti-static properties, wherein the scratch-resistant layer has a surface resistivity in the range from 108 to 1012?/?, and a pencil hardness of 3H or more as measured according to JIS K5400 standard method. The optical film of the invention has a low volume shrinkage, does not warp, and possesses excellent anti-static properties and high hardness properties.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: January 11, 2011
    Assignee: Eternal Chemical Co., Ltd.
    Inventor: Lung-Lin Hsu
  • Patent number: 7862223
    Abstract: The subject invention provides a thin and flexible light guide element, which comprises a first optical layer composed of a flexible transparent material; a second optical layer formed on the lower side of the first optical layer and having a light-adjusting structure to change the light path; and a third optical layer formed on the upper side of the first optical layer and having a convex-concave structure to homogenize the light emitted from the first optical layer, wherein the first and second optical layers have different refractive indices.
    Type: Grant
    Filed: April 4, 2008
    Date of Patent: January 4, 2011
    Assignee: Eternal Chemical Co., Ltd.
    Inventor: Lung-Lin Hsu
  • Patent number: 7833622
    Abstract: The subject invention provides an optical film, comprising a transparent substrate and a resin coating having a convex-concave structure on at least one surface of the substrate, wherein said resin coating comprises a plurality of organic particles and a binder, the organic particles being formed from a polyacrylate resin which comprises at least one acrylate monomer type having multiple functional groups as polymerization units, said multi-functional acrylate monomers being in an amount from 30 to 70 wt % based on the total weight of the monomers, and wherein the organic particles have a mean particle size, the particle size distribution of the organic particles ranging within about ±5% of the mean particle size, and wherein the organic particles are in an amount from about 180 to 320 parts by weight per 100 parts by weight of the solid contents of the binder.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: November 16, 2010
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Shu-Hong Liu, Yi-Chia Wang
  • Patent number: 7794829
    Abstract: The invention pertains to a reflector comprising a substrate capable of reflecting light, characterized in that the reflector exhibits a gloss of less than 10% as determined when a light source is projected on the surface of the reflector at 60 degree. The reflector of the invention allows the light to be reflected uniformly and possesses a high reflectivity.
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: September 14, 2010
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Tu-Yi Wu, Lung-Lin Hsu, Chia-Yi Lu, Yung-Ming She
  • Patent number: 7727616
    Abstract: The invention pertains to a scratch-resistant thin film comprising a transparent substrate wherein the substrate comprises at least one micro structured layer on the lower side and at least one scratch-resistant layer on the upper side, wherein said scratch-resistant layer has a convex-concave structure, a surface resistivity in the range from 108 to 1012?/?, a pencil hardness of 3H or more as measured according to JIS K5400 standard method, and a haze in the range from 30% to 98% as measured according to JIS K7136 method. The thin film of the invention exhibits both light enhancement and light uniformization properties, has a low volume shrinkage, does not warp, and possesses excellent anti-static and high hardness properties.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: June 1, 2010
    Assignee: Eternal Chemical Co., Ltd.
    Inventor: Lung-Lin Hsu
  • Publication number: 20090163614
    Abstract: The invention provides a coating composition comprising a thermal plastic resin selected from the group consisting of a polycycloolefin resin, polyester resin, polyacrylate resin, and a mixture thereof; and a radiation curable resin comprising a radiation polymer containing at least one mono- or multi-functional acrylic acid based monomer as a polymerization unit, an oligomer containing an ethylenically unsaturated functional group, and a photoinitiator, wherein the radiation curable resin is used in an amount of 220-1000% by weight on the basis of the weight of the thermal plastic resin. The invention improves the hardness of the coating composition, prevent the coated substrate from being scratched or impaired, and impart the substrate with high transparency without causing warping problem.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 25, 2009
    Inventors: Lung-Lin HSU, Sue-Hong LIU
  • Patent number: 7504450
    Abstract: The invention pertains to a resin composition capable of absorbing UV light, comprising inorganic particulates and a resin containing as a polymerized unit an acrylate monomer. The composition of the invention can be formulated into a coating for a substrate so as to impart UV resistance and good weatherability to the coated substrate.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: March 17, 2009
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Tu-Yi Wu, Lung-Lin Hsu, Mao-Jung Yeh, Chin-Mu Lee
  • Publication number: 20080311351
    Abstract: The subject invention relates to a scratch-resistant optical film, which comprises: (a) a transparent substrate having a first surface and a second surface; (b) a diffusion layer on the first surface of the substrate, which has a convex-concave structure and is comprised of a first hard coat layer comprising organic particles; (c) a scratch-resistant layer on the second surface of the substrate, which is comprised of a second hard coat layer; wherein the organic particles in the first hard coat layer are formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, said multi-functional acrylate monomer being in an amount from 30 to 70 wt % based on the total weight of the monomer used, and wherein the organic particles have a single mean particle size and have a particle size distribution in the range within about ±5% of the mean particle size.
    Type: Application
    Filed: June 12, 2008
    Publication date: December 18, 2008
    Inventors: Lung-Lin Hsu, Shu-Hong Liu, Chun-Hung Chou
  • Publication number: 20080311352
    Abstract: The subject invention provides an optical film, comprising a transparent substrate and a resin coating having a convex-concave structure on at least one surface of the substrate, wherein said resin coating comprises a plurality of organic particles and a binder, the organic particles being formed from a polyacrylate resin which comprises at least one acrylate monomer type having multiple functional groups as polymerization units, said multi-functional acrylate monomers being in an amount from 30 to 70 wt % based on the total weight of the monomers, and wherein the organic particles have a mean particle size, the particle size distribution of the organic particles ranging within about ±5% of the mean particle size, and wherein the organic particles are in an amount from about 180 to 320 parts by weight per 100 parts by weight of the solid contents of the binder.
    Type: Application
    Filed: June 12, 2008
    Publication date: December 18, 2008
    Inventors: Lung-Lin Hsu, Shu-Hong Liu, Yi-Chia Wang
  • Publication number: 20080305301
    Abstract: The subject invention provides an optical film comprising a substrate and a resin coating having a convex-concave structure on at least one surface of the substrate, wherein said resin coating comprises a plurality of organic particles and a binder, the organic particles being formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, and said multi-functional acrylate monomer is in an amount from 30 wt % to 70 wt % based on the total weight of the monomers, and wherein the organic particles have a single mean particle size, the particle size distribution of the organic particles ranges within about ±30% of the mean particle size, and the organic particles are in an amount from about 110 to about 360 parts by weight per 100 parts by weight of the solids content of the binder.
    Type: Application
    Filed: June 6, 2008
    Publication date: December 11, 2008
    Inventors: Lung-Lin HSU, Chun-Ting WANG