Patents by Inventor Luping Wang

Luping Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200165941
    Abstract: A valve mechanism includes a valve, a camshaft, a fixed support, an intermediate swing arm and a supporting base. The fixed support is provided with a connecting-portion via hole running from top to bottom, two oil passages are defined in a connecting portion, and each of the oil passages is connected with the connecting-portion via hole and a corresponding intermediate swing arm shaft hole. The supporting base defines first and second oil feeding passages therein, the first supporting-base oil feeding passage is communicated with the connecting-portion via hole, and an upper end of the second supporting-base oil feeding passage extends to a base-body camshaft supporting portion of the supporting base. An engine and a vehicle are also provided.
    Type: Application
    Filed: June 7, 2018
    Publication date: May 28, 2020
    Applicant: GREAT WALL MOTOR COMPANY LIMITED
    Inventors: Tao LIU, Fabao YANG, Ji YIN, Jiajia HU, Liming XU, Song ZHANG, Luping LIU, Yanlong FANG, Lei WANG
  • Publication number: 20200141291
    Abstract: A valve mechanism includes a valve, a camshaft, an intermediate swing arm located between a cam and the valve, a lift regulating mechanism and a roller assembly. The cam drives the valve to move by means of the intermediate swing arm. The roller assembly is supported by the cam, an eccentric wheel of the lift regulating mechanism and an intermediate swing arm roller. A peripheral surface of the eccentric wheel includes a lift regulating section having a start point and an end point, a maximum lift point of the lift regulating section is located between the start point and the end point, and the lift regulating section is divided into a first section which is convex and a second section having at least a part thereof concave.
    Type: Application
    Filed: June 7, 2018
    Publication date: May 7, 2020
    Applicant: GREAT WALL MOTOR COMPANY LIMITED
    Inventors: Tao LIU, Ji YIN, Luping LIU, Liming XU, Jiajia HU, Fabao YANG, Song ZHANG, Yanlong FANG, Lei WANG
  • Publication number: 20190219258
    Abstract: Disclosed are an LED light source apparatus, a lighting device, and a lighting control method. The LED light source apparatus includes a plurality of light mixing units. Each light mixing unit comprises LED chips of at least four colors, and the at least four colors at least include red and green. The plurality of light mixing units is uniformly distributed on a bearing surface along a ring.
    Type: Application
    Filed: March 28, 2019
    Publication date: July 18, 2019
    Applicants: Shanghai Sansi Electronic Engineering Co., Ltd., Sansi Optoelectronics Technology (Shanghai) Co., Ltd., Shanghai Sansi Technology Co., Ltd., Jiashan Sansi Optoelectronic Technology Co., Ltd.
    Inventors: Bishou CHEN, Peng WANG, Xiaoliang HE, Luping MIU
  • Publication number: 20190078696
    Abstract: Fluid supply packages of varying types are described, which are useful for delivery of fluids to fluid-utilizing facilities such as semiconductor manufacturing facilities, solar panel manufacturing facilities, and flat-panel display manufacturing facilities. The fluid supply packages include fluid supply vessels and valve heads of varied configuration, as useful to constitute fluid supply packages that are pressure-regulated and/or adsorbent-based in character.
    Type: Application
    Filed: July 8, 2016
    Publication date: March 14, 2019
    Inventors: Glenn M. Tom, Karl W. Olander, James A. Dietz, Michael J. Wodjenski, Edward A. Sturm, Susan K. Dimascio, Luping Wang, James V. McManus, Steven M. Lurcott, Jose I. Amo, Paul J. Marganski, Joseph D. Sweeney, Shaun M. Wilson, Steven E. Bishop, Greg Nelson, Donald J. Carruthers, Sharad N. Yedave, Ying Tang, Joseph Despres, Barry Chambers, Richard Ray, Daniel Elzer
  • Patent number: 9132412
    Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: September 15, 2015
    Assignee: ENTEGRIS, INC.
    Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
  • Publication number: 20140020419
    Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.
    Type: Application
    Filed: September 24, 2013
    Publication date: January 23, 2014
    Applicant: Advanced Technology Materials, Inc.
    Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney
  • Patent number: 8562937
    Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: October 22, 2013
    Assignee: Nantero Inc.
    Inventors: J. Donald Carruthers, Xueping Xu, Luping Wang
  • Patent number: 8539781
    Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.
    Type: Grant
    Filed: June 22, 2008
    Date of Patent: September 24, 2013
    Assignee: Advanced Technology Materials, Inc.
    Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
  • Publication number: 20110048063
    Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.
    Type: Application
    Filed: June 22, 2008
    Publication date: March 3, 2011
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
  • Patent number: 7857880
    Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: December 28, 2010
    Assignee: Advanced Technology Materials, Inc.
    Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
  • Patent number: 7798168
    Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: September 21, 2010
    Assignee: Advanced Technology Materials, Inc.
    Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
  • Publication number: 20100059694
    Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.
    Type: Application
    Filed: November 10, 2009
    Publication date: March 11, 2010
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
  • Patent number: 7614421
    Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: November 10, 2009
    Assignee: Advanced Technology Materials, Inc.
    Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
  • Publication number: 20090272272
    Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.
    Type: Application
    Filed: February 3, 2009
    Publication date: November 5, 2009
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
  • Publication number: 20090099016
    Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.
    Type: Application
    Filed: December 19, 2006
    Publication date: April 16, 2009
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: J. Donald Carruthers, Xueping Xu, Luping Wang
  • Patent number: 7485169
    Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: February 3, 2009
    Assignee: Advanced Technology Materials, Inc.
    Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
  • Patent number: 7437060
    Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
    Type: Grant
    Filed: June 21, 2005
    Date of Patent: October 14, 2008
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Luping Wang, Thomas H. Baum, Chongying Xu
  • Patent number: 7328716
    Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: February 12, 2008
    Assignee: Advanced Technology Materials, Inc.
    Inventors: W. Karl Olander, Matthew B Donatucci, Luping Wang, Michael J. Wodjenski
  • Publication number: 20070157804
    Abstract: A method and apparatus for decommissioning a fluid storage and dispensing system including a fluid storage and dispensing vessel containing adsorbent sorptively retaining residual fluid. The decommissioning involves removing the residual fluid, including superheating the adsorbent to temperature in a range of from (i) temperature substantially in excess of bulk desorption temperature of the fluid on the adsorbent, up to (ii) temperature substantially in excess of decomposition temperature of the fluid.
    Type: Application
    Filed: January 4, 2007
    Publication date: July 12, 2007
    Inventors: James V. McManus, Luping Wang
  • Patent number: D887060
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: June 9, 2020
    Assignees: SHANGHAI SANSI ELECTRONIC ENGINEERING CO. LTD., SANSI OPTOELECTRONICS TECHNOLOGY (SHANGHAI) CO. LTD., SHANGHAI SANSI TECHNOLOGY CO. LTD., JIASHAN SANSI OPTOELECTRONIC TECHNOLOGY CO. LTD.
    Inventors: Peng Wang, Yinghong Shuai, Xiaoliang He, Luping Miu