Patents by Inventor Luping Wang
Luping Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11619538Abstract: Disclosed is device for calibrating oil-water two-phase flow sensor, the device includes a wellbore model, an oil-water separation mechanism, an oil-water mixing mechanism, an oil inlet mechanism and a water inlet mechanism, the oil-water separation mechanism has a mixture inlet, an oil outlet, and a water outlet. The beneficial effect of the technical scheme proposed in the disclosure is: the oil-water mixture flowing out of the wellbore model is separated by an oil-water separation mechanism, and the separated oil and water are introduced into the oil-water mixing mechanism through an oil inlet mechanism and a water inlet mechanism, respectively, for remixing, the oil-water mixture formed by re-mixing enters the wellbore model, and enters the next cycle, which can realize the reuse of oil and water, the miniaturization of the device, and reduction of the production cost of the device.Type: GrantFiled: July 6, 2021Date of Patent: April 4, 2023Assignee: YANGTZE UNIVERSITYInventors: Yong Wei, Tao Guo, XiaoMing Cui, YiPan Lu, YuXiang Wang, LuPing Wang, Shuang Feng, Si Lin
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Publication number: 20220381601Abstract: Disclosed is device for calibrating oil-water two-phase flow sensor, the device includes a wellbore model, an oil-water separation mechanism, an oil-water mixing mechanism, an oil inlet mechanism and a water inlet mechanism, the oil-water separation mechanism has a mixture inlet, an oil outlet, and a water outlet. The beneficial effect of the technical scheme proposed in the disclosure is: the oil-water mixture flowing out of the wellbore model is separated by an oil-water separation mechanism, and the separated oil and water are introduced into the oil-water mixing mechanism through an oil inlet mechanism and a water inlet mechanism, respectively, for remixing, the oil-water mixture formed by re-mixing enters the wellbore model, and enters the next cycle, which can realize the reuse of oil and water, the miniaturization of the device, and reduction of the production cost of the device.Type: ApplicationFiled: July 6, 2021Publication date: December 1, 2022Inventors: Yong Wei, Tao Guo, XiaoMing Cui, YiPan Lu, YuXiang Wang, LuPing Wang, Shuang Feng, Si Lin
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Publication number: 20190078696Abstract: Fluid supply packages of varying types are described, which are useful for delivery of fluids to fluid-utilizing facilities such as semiconductor manufacturing facilities, solar panel manufacturing facilities, and flat-panel display manufacturing facilities. The fluid supply packages include fluid supply vessels and valve heads of varied configuration, as useful to constitute fluid supply packages that are pressure-regulated and/or adsorbent-based in character.Type: ApplicationFiled: July 8, 2016Publication date: March 14, 2019Inventors: Glenn M. Tom, Karl W. Olander, James A. Dietz, Michael J. Wodjenski, Edward A. Sturm, Susan K. Dimascio, Luping Wang, James V. McManus, Steven M. Lurcott, Jose I. Amo, Paul J. Marganski, Joseph D. Sweeney, Shaun M. Wilson, Steven E. Bishop, Greg Nelson, Donald J. Carruthers, Sharad N. Yedave, Ying Tang, Joseph Despres, Barry Chambers, Richard Ray, Daniel Elzer
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Patent number: 9132412Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.Type: GrantFiled: September 24, 2013Date of Patent: September 15, 2015Assignee: ENTEGRIS, INC.Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
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Publication number: 20140020419Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.Type: ApplicationFiled: September 24, 2013Publication date: January 23, 2014Applicant: Advanced Technology Materials, Inc.Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney
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Patent number: 8562937Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.Type: GrantFiled: December 19, 2006Date of Patent: October 22, 2013Assignee: Nantero Inc.Inventors: J. Donald Carruthers, Xueping Xu, Luping Wang
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Patent number: 8539781Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.Type: GrantFiled: June 22, 2008Date of Patent: September 24, 2013Assignee: Advanced Technology Materials, Inc.Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
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Publication number: 20110048063Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.Type: ApplicationFiled: June 22, 2008Publication date: March 3, 2011Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: J. Donald Carruthers, Karl Boggs, Luping Wang, Shaun Wilson, Jose I. Arno, Paul J. Marganski, Steven M. Bilodeau, Peng Zou, Brian Bobita, Joseph D. Sweeney, Douglas Edwards
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Patent number: 7857880Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.Type: GrantFiled: February 3, 2009Date of Patent: December 28, 2010Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
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Patent number: 7798168Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: November 10, 2009Date of Patent: September 21, 2010Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
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Publication number: 20100059694Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: ApplicationFiled: November 10, 2009Publication date: March 11, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
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Patent number: 7614421Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: February 23, 2006Date of Patent: November 10, 2009Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
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Publication number: 20090272272Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.Type: ApplicationFiled: February 3, 2009Publication date: November 5, 2009Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
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Publication number: 20090099016Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.Type: ApplicationFiled: December 19, 2006Publication date: April 16, 2009Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: J. Donald Carruthers, Xueping Xu, Luping Wang
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Patent number: 7485169Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.Type: GrantFiled: September 12, 2006Date of Patent: February 3, 2009Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang
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Patent number: 7437060Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.Type: GrantFiled: June 21, 2005Date of Patent: October 14, 2008Assignee: Advanced Technology Materials, Inc.Inventors: Luping Wang, Thomas H. Baum, Chongying Xu
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Patent number: 7328716Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: February 22, 2005Date of Patent: February 12, 2008Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B Donatucci, Luping Wang, Michael J. Wodjenski
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Publication number: 20070157804Abstract: A method and apparatus for decommissioning a fluid storage and dispensing system including a fluid storage and dispensing vessel containing adsorbent sorptively retaining residual fluid. The decommissioning involves removing the residual fluid, including superheating the adsorbent to temperature in a range of from (i) temperature substantially in excess of bulk desorption temperature of the fluid on the adsorbent, up to (ii) temperature substantially in excess of decomposition temperature of the fluid.Type: ApplicationFiled: January 4, 2007Publication date: July 12, 2007Inventors: James V. McManus, Luping Wang
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Publication number: 20070062167Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.Type: ApplicationFiled: September 12, 2006Publication date: March 22, 2007Inventors: W. Olander, Joseph Sweeney, Luping Wang
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Patent number: 7105037Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.Type: GrantFiled: September 26, 2003Date of Patent: September 12, 2006Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Joseph D. Sweeney, Luping Wang