Abstract: A coating method for preparing diamond thin film continuously by HFCVD device includes the steps of: (a) carbonizing left and right chamber hot filaments; (b) disposing a substrate on a platform along with a trolley in a sample access chamber under vacuum condition; opening a left chamber gate valve and moving the substrate to left thin film growth chamber; closing the left chamber gate valve to grow diamond thin film on the substrate; (c) repeating step (b) by using a right chamber gate valve and right thin film growth chamber to grow diamond thin film; (d) opening the left chamber gate valve and moving the substrate to the sample access chamber; closing the left chamber gate valve and dropping to room temperature while under vacuum condition; releasing the vacuum condition and taking out the substrate with diamond thin film; (e) repeating step (d) for the right chamber gate valve.

Abstract: A HFCVD device for continuous preparation of a diamond thin film includes left and right chamber gate valves, left and right thin film growth chambers, left and right chamber water-cooled electrodes, left and right chamber hot filament racks, left and right chamber hot filaments, a sample access chamber, a substrate, a substrate platform, and a substrate trolley. The hot filament is configured in a vertical layout to prevent being bent and deformed during the heating and coating processes. The hot filament is stably kept a distance from the substrate to improve the coating quality and enhance the uniformity of the diamond film. The device is able to continuously use, to reduce filament consumption, to reduce auxiliary times for reinstalling the filament, vacuuming, carbonizing the filament, and filling the vacuum chamber, and to greatly improve the production efficiency of diamond thin film.